Evaluation of glass thin films by the ultrasonic microspectroscopy technology

超声显微光谱技术评价玻璃薄膜

• 批准号: 23656260
• 负责人: KUSHIBIKI Jun-ichi
• 金额: $ 2.58万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Exploratory Research
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2012
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23656260/
• 关键词: 超音波マイクロスペクトロスコピー技術; 薄膜; 音響特性計測; 不純物; 欠陥

The ultrasonic microspectroscopy technology was applied to evaluation of glass thin films. Two SiO2/Ta2O5 multilayer films were deposited on SiO2 glass substrates by rf ion beam sputtering, and one of them was annealed. Frequency characteristics of leaky surface acoustic wave (LSAW) velocity were measured for specimens by the line-focus-beam ultrasonic material characterization system, and LSAW velocity changes due to the annealing were detected. TiO2-SiO2 thin films were also deposited on SiO2 glass substrates or TiO2-SiO2 glass substrates, and LSAW velocity changes due to the fictivetemperature changes of films were detected.

超声显微光谱技术应用于玻璃薄膜的评价。采用射频离子束溅射技术在SiO2玻璃基板上沉积两层SiO2/Ta2O5多层薄膜，并对其中一层进行退火处理。通过线聚焦束超声材料表征系统测量了样品的泄漏表面声波（LSAW）速度的频率特性，并检测了退火引起的LSAW速度变化。 TiO2-SiO2薄膜也沉积在SiO2玻璃基板或TiO2-SiO2玻璃基板上，并检测到由于薄膜的假想温度变化而导致的LSAW速度变化。

项目成果

直線集束ビーム超音波材料解析システムによるガラス多層膜の評価

使用线性聚焦光束超声材料分析系统评估玻璃多层膜

• 发表时间: 2011
• 作者: H. Kikuchi;J. Kumano;T. Nakai;S. Hashi;K. Ishiyama;荒川元孝,櫛引淳一,伊藤和彦,江藤和幸
• 通讯作者: 荒川元孝,櫛引淳一,伊藤和彦,江藤和幸

直線集束ビーム超音波材料解析システムによるガラス薄膜の評価

使用线性聚焦光束超声材料分析系统评估玻璃薄膜

• 发表时间: 2011
• 作者: H. Kikuchi;J. Kumano;T. Nakai;S. Hashi;K. Ishiyama;荒川元孝,櫛引淳一,伊藤和彦,江藤和幸;荒川元孝,櫛引淳一,伊藤和彦,江藤和幸
• 通讯作者: 荒川元孝,櫛引淳一,伊藤和彦,江藤和幸