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Atom Probe Characterisation of Individual Dislocations in Multi-Crystalline Silicon

Atom Probe Characterisation of Individual Dislocations in Multi-Crystalline Silicon
多晶硅中单个位错的原子探针表征
批准号:
1801718
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2016
资助国家:
英国
项目状态:
已结题
起止时间:
2016 至 --

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中文摘要
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英文摘要
The production of low-cost and reliable electricity with minimal environmental impact is one of the biggest challenges for the future of humanity. Solar power is the cleanest and most abundant source of energy, and as such photovoltaic devices that convert light to electricity will likely be a major part of overcoming that challenge. Multicrystalline silicon (mc-Si) solar cells, which currently represent around 60% of the world market for solar energy production, have limited performance due to the impurities in the raw material. Their efficiency is heavily dependent on control of the impurity distribution (gettering) and effective hydrogen passivation of defects present in the material. However, the gettering and passivation processes are not completely effective and the reasons for this are not well understood. This project which is based both in the Atom Probe Group and Semiconductor and Silicon Photovoltaics Group will used advanced FIB (focused ion beam) and APT (atom probe tomography) techniques to perform "atom by atom" analyses on individual dislocations whose electrical properties have been well characterised. The techniques to be used have only been very recently developed and are unique to the Materials Department at Oxford. The result of this project will be a better understanding of the problems that limit the efficiency of mc-Si solar cells and potentially it will result in improved performance devices. In particular, the correlation between defect type, impurity atoms present, and electrical activity after commercial cell gettering and passivation processes will be elucidated. Measurements of the electrical activity of defects will be made at different stages in cell processing so that key parameters in the processing with regard to dislocation activity can be identified. The project is in collaboration with the mc-Si manufacturer CrystaloxPV and Oxford Instruments who are supplying a dedicated Electron Beam Induced Current (EBIC) system for use with the project to characterise electrical activity of specific microstructural features. The project will be also used to assess the efficacy of novel hydrogen passivation and gettering techniques being developed in the Oxford Semiconductor Group. The research will also contribute to the EPSRC-funded multi-institutional SuperSilicon PV: extending the limits of material performance project. It contributes directly to some of EPSRCs strategic research areas in particular the Energy theme and the Renewable Energy sub-theme.
期刊论文(5)
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会议论文
Atom Probe Tomography Study of Gettering in High-Performance Multicrystalline Silicon
高性能多晶硅吸杂的原子探针断层扫描研究
DOI: 10.1109/jphotov.2020.2974795
发表时间: 2020
期刊: IEEE Journal of Photovoltaics
影响因子: 3
作者: [Tweddle D]
通讯作者: Tweddle D
Atom probe Tomography of fast-diffusing impurities and the effect of gettering in multicrystalline silicon
多晶硅中快速扩散杂质的原子探针断层扫描和吸杂效应
DOI: 10.1063/1.5049338
发表时间: 2018
期刊:
影响因子: --
作者: [Tweddle D]
通讯作者: Tweddle D
Identification of colloidal silica polishing induced contamination in silicon
硅中胶体二氧化硅抛光引起的污染的鉴定
DOI: 10.1016/j.matchar.2019.04.029
发表时间: 2019
期刊: Materials Characterization
影响因子: 4.7
作者: [Tweddle D]
通讯作者: Tweddle D
DOI: 10.1002/pip.3184
发表时间: 2019
期刊: Research and Applications
影响因子: --
作者: [Tweddle D]
通讯作者: Tweddle D
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