Micro/nano fabrication of x-ray optics for phase-contrast imaging

两年来，我们取得了进步。首先是创建了第一个200nm周期的硬x射线光栅，可用于构建高灵敏度的x射线相衬成像装置；二是开发高质量和低成本的第二代光栅，用于台式系统。第一个里程碑是与宾夕法尼亚州立大学的Douglas Wolfe教授合作，与Francesco De Carlo博士合作，在阿贡国家实验室先进光子源的2-BM-B光束线上建立了超灵敏成像系统。第二个里程碑是与NIST的CNST纳米实验室合作达成的。第二代光栅正在美国国立卫生研究院的实验室进行测试。

In the past two years we accomplished advances. The first is to create the first hard x-ray gratings of 200 nm period that can be used to construct a highly sensitive x-ray phase contrast imaging device; the second is to develop the second generation gratings of higher quality and much reduced cost for use in bench-top systems. The first milestone was reached in collaboration with prof. Douglas Wolfe of Penn State University, leading to an ultra-sensitive imaging system on the 2-BM-B beamline of the Advanced Photon Source of Argonne National Laboratory in collaboration with Dr. Francesco De Carlo. The second milestone was reached in collaboration with Nanofab Facility of CNST, NIST. The second generation gratings are being tested in our laboratory at NIH.