Microsystems fabrication involving anisotropic etching of silicon: fundamental and applied studies
Microsystems fabrication involving anisotropic etching of silicon: fundamental and applied studies
批准号:
121286-2001
负责人:
Landsberger, Leslie
金额:
$2.48万
依托单位:
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2003
资助国家:
加拿大
项目状态:
已结题
起止时间:
2003-01-01 至 2004-12-31
中文摘要
点击翻译按钮获取中文摘要
英文摘要
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Wet anisotropic etching of silicon -- mechanisms, and application to single-crystal silicon nanostructures
-
批准号:121286-2005
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.48万
-
财政年份:2005
-
负责人:Landsberger, Leslie
-
依托单位:
Microsystems fabrication involving anisotropic etching of silicon: fundamental and applied studies
-
批准号:121286-2001
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.48万
-
财政年份:2004
-
负责人:Landsberger, Leslie
-
依托单位:
Microsystems fabrication involving anisotropic etching of silicon: fundamental and applied studies
-
批准号:121286-2001
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.48万
-
财政年份:2002
-
负责人:Landsberger, Leslie
-
依托单位:
Microsystems fabrication involving anisotropic etching of silicon: fundamental and applied studies
-
批准号:121286-2001
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$2.48万
-
财政年份:2001
-
负责人:Landsberger, Leslie
-
依托单位:
Anisotropic etching of silicon applied to microelectromechanical device processing and alternative processes for thin gate dielectrics
-
批准号:121286-1997
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.35万
-
财政年份:2000
-
负责人:Landsberger, Leslie
-
依托单位:
Anisotropic etching of silicon applied to microelectromechanical device processing and alternative processes for thin gate dielectrics
-
批准号:121286-1997
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.35万
-
财政年份:1999
-
负责人:Landsberger, Leslie
-
依托单位:
Anisotropic etching of silicon applied to microelectromechanical device processing and alternative processes for thin gate dielectrics
-
批准号:121286-1997
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.28万
-
财政年份:1998
-
负责人:Landsberger, Leslie
-
依托单位:
Fabrication and characterization of special process tunnel oxides
-
批准号:193498-1996
-
项目类别:National Research Council / NSERC Research Partnership
-
资助金额:$2.55万
-
财政年份:1997
-
负责人:Landsberger, Leslie
-
依托单位:
Anisotropic etching of silicon applied to microelectromechanical device processing and alternative processes for thin gate dielectrics
-
批准号:121286-1997
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.17万
-
财政年份:1997
-
负责人:Landsberger, Leslie
-
依托单位:
Fabrication of silicon-based microelectromechanical devices
-
批准号:121286-1995
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$0.9万
-
财政年份:1996
-
负责人:Landsberger, Leslie
-
依托单位:
Fabrication of silicon-based microelectromechanical devices
-
批准号:121286-1995
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$0.9万
-
财政年份:1995
-
负责人:Landsberger, Leslie
-
依托单位:
High-quality Si02 films on Si created by corona-discharge at low thermal budget
-
批准号:121286-1992
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.24万
-
财政年份:1994
-
负责人:Landsberger, Leslie
-
依托单位:
High-quality Si02 films on Si created by corona-discharge at low thermal budget
-
批准号:121286-1992
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.24万
-
财政年份:1993
-
负责人:Landsberger, Leslie
-
依托单位:
High-quality Si02 films on Si created by corona-discharge at low thermal budget
-
批准号:121286-1992
-
项目类别:Discovery Grants Program - Individual
-
资助金额:$1.24万
-
财政年份:1992
-
负责人:Landsberger, Leslie
-
依托单位:
国内基金
海外基金
Ni-20Cr合金梯度纳米结构的低温构筑及其腐蚀行为研究
-
批准号:52301123
-
项目类别:青年科学基金项目
-
资助金额:30.00万元
-
批准年份:2023
-
负责人:郭晓开
-
依托单位: