High resolution customized chirped phase grating mask

高分辨率定制啁啾相位光栅掩模

• 批准号: 435999-2012
• 负责人: Chaker, Mohamed
• 金额: $ 2.91万
• 依托单位: Institut national de la recherche scientifique
• 依托单位国家: 加拿大
• 项目类别: Collaborative Research and Development Grants
• 财政年份: 2013
• 资助国家: 加拿大
• 起止时间: 2013-01-01 至 2014-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=533405
• 关键词: resolution; customized; chirped; phase; grating

The possibility of creating chirped FBGs, capable of producing a significant dispersion (in the range of few thousands picoseconds per nanometer) and having a bandwidth of ~1 nm would open up a tremendously promising new path for dispersion-engineering signal processing. To overcome the limitations of present FBGs technology, we propose to push the edge of two micro-nanofabrication technologies involved in the fabrication of highly chirped Phase Mask (PM), namely electron beam lithography and plasma etching, the PM technique being the most effective and common method for the fabrication of FBGs. The main objective of this multidisciplinary project is to explore the fabrication of PMs with a chirp rate of 0.01 nm/cm or even lower allowing the fabrication of chirped FBGs with unique performances in terms of bandwidth (~1 nm) and dispersion (higher than 5 000 ps/nm) over 15-cm long gratings.

能够产生显著色散(在每纳米几千皮秒的范围内)并具有~1 nm带宽的啁啾FBG的可能性将为色散工程信号处理开辟一条非常有前途的新途径。为了克服目前FBG技术的局限性，我们提出了两种制作高啁啾位相掩模(PM)的微纳加工技术，即电子束光刻技术和等离子体刻蚀技术，这两种技术是制作FBG最有效和最常见的方法。这个多学科项目的主要目标是探索制作啁啾速率为0.01 nm/cm甚至更低的相位调制，从而在15 cm长的光栅上制作具有独特性能的啁啾FBG，其带宽(~1 nm)和色散(大于5000 ps/nm)。