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Novel main group and transition metal precursors for atomic layer and chemical vapor deposition

Novel main group and transition metal precursors for atomic layer and chemical vapor deposition
用于原子层和化学气相沉积的新型主族和过渡金属前体
批准号:
445964-2012
负责人:
Song, Datong
金额:
$10.9万
依托单位:
依托单位国家:
加拿大
项目类别:
Collaborative Research and Development Grants
财政年份:
2013
资助国家:
加拿大
项目状态:
已结题
起止时间:
2013-01-01 至 2014-12-31

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中文摘要
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英文摘要
As the conventional silica-based dielectric material cannot satisfy the requirement of modern microelectronics, several transition metal oxides with superior properties have been identified as the next generation dielectric materials for microelectronics. One aspect of this research proposal is concerned with the development of new precursors and processes for deposition of thin films of transition metal oxides used in microelectronics and semiconductor fabrication. The second aspect of this research is aimed to develop new (Group III/V and hybrid) molecular precursors and processes for the production of semiconductors that can be used in optoelectronics.
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Organometallic chemistry and catalysis using 3d metals
  • 批准号:
    RGPIN-2019-06576
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $3.5万
  • 财政年份:
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  • 负责人:
    Song, Datong
  • 依托单位:
Organometallic chemistry and catalysis using 3d metals
  • 批准号:
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  • 项目类别:
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  • 资助金额:
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  • 财政年份:
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  • 项目类别:
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  • 财政年份:
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  • 批准号:
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  • 项目类别:
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  • 资助金额:
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  • 财政年份:
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  • 负责人:
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国内基金
海外基金
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  • 批准号:
    2018JJ4093
  • 项目类别:
    省市级项目
  • 资助金额:
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  • 批准年份:
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  • 负责人:
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