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Ion etching modeling of integrated circuits

Ion etching modeling of integrated circuits
集成电路的离子刻蚀建模
批准号:
447646-2013
负责人:
Smy, Tom
金额:
$1.68万
依托单位:
依托单位国家:
加拿大
项目类别:
Engage Grants Program
财政年份:
2013
资助国家:
加拿大
项目状态:
已结题
起止时间:
2013-01-01 至 2014-12-31

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中文摘要
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英文摘要
This project will involve the development of a software tool for the simulation of the application of dry etching
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Multi-physics Simulation and Modelling of Metasurfaces for Communications and Sensor Applications from Device to System
  • 批准号:
    RGPIN-2019-06315
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.04万
  • 财政年份:
    2022
  • 负责人:
    Smy, Tom
  • 依托单位:
Multi-physics Simulation and Modelling of Metasurfaces for Communications and Sensor Applications from Device to System
  • 批准号:
    RGPIN-2019-06315
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.04万
  • 财政年份:
    2021
  • 负责人:
    Smy, Tom
  • 依托单位:
Multi-physics Simulation and Modelling of Metasurfaces for Communications and Sensor Applications from Device to System
  • 批准号:
    RGPIN-2019-06315
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.04万
  • 财政年份:
    2020
  • 负责人:
    Smy, Tom
  • 依托单位:
Multi-physics Simulation and Modelling of Metasurfaces for Communications and Sensor Applications from Device to System
  • 批准号:
    RGPIN-2019-06315
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.04万
  • 财政年份:
    2019
  • 负责人:
    Smy, Tom
  • 依托单位:
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