High resolution customized chirped phase grating mask

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The possibility of creating chirped FBGs, capable of producing a significant dispersion (in the range of few thousands picoseconds per nanometer) and having a bandwidth of ~1 nm would open up a tremendously promising new path for dispersion-engineering signal processing. To overcome the limitations of present FBGs technology, we propose to push the edge of two micro-nanofabrication technologies involved in the fabrication of highly chirped Phase Mask (PM), namely electron beam lithography and plasma etching, the PM technique being the most effective and common method for the fabrication of FBGs. The main objective of this multidisciplinary project is to explore the fabrication of PMs with a chirp rate of 0.01 nm/cm or even lower allowing the fabrication of chirped FBGs with unique performances in terms of bandwidth (~1 nm) and dispersion (higher than 5 000 ps/nm) over 15-cm long gratings.