Development of New Point Sources for IONS and Electrons
Development of New Point Sources for IONS and Electrons
批准号:
9112550
负责人:
John Spence
金额:
$14.93万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-07-15 至 1993-06-30
中文摘要
该奖项将用于建造两个特高压测试室,用于开发新型高相干电子或离子源。该仪器将结合场离子显微镜、场发射显微镜和低压场发射电子枪的功能。场离子显微镜图像将用于表征和形成单原子电子或离子发射区。场发射模式将用于亮度测量,并且将在场发射枪中评估尖端的操作。主要兴趣是这些源的开发和应用,用于微分析和材料表征的场发射电子束仪器。新光源在低电压反射和透射电子全息术、低电压扫描电子显微镜、电子和质子干涉测量和电子能谱学中的应用。量子力学和发射特性的经典计算伴随着这个研究项目。最终的兴趣是将新的电子和离子源应用于CHREM正在开发的新的电子显微镜和微量分析技术,该技术有大约60个来自亚利桑那州立大学社区的用户。一个测试室将用于形成和评估单原子尖端,测量尖端性能,如相干性和亮度,将具有FIM/FEG/FEM能力,并可烘烤到200℃;第二个测试室将具有几乎相同的配置,主要应用是将单原子源实现到一个简单的低压电子显微镜柱中。
英文摘要
This award is for the construction of two UHV test chambers which will be used for the development of a new type of highly coherent electron or ion source. The proposed instruments will combine the functions of a field-ion microscope, a field-emission microscope, and a low voltage field-emission electron gun. The field-ion microscope images will be used to characterize and form single-atom electron or ion emitting regions. The field-emission mode will be used for brightness measurements, and the tips will be evaluated for operation in a field emission gun. The main interest is the development and application of these sources for use in field- emission electron beam instruments for microanalysis and materials characterization. Applications of the new sources to low voltage reflection and transmission electron holography, low voltage scanning electron microscopy, electron and proton interferometry and electron spectroscopy. Quantum-mechanical and classical calculations of the emission properties accompany this research program. The ultimate interest is in the application of new electron and ion sources to the new electron-microscopy and microanalysis techniques under development at CHREM, which has about 60 users from the ASU community. One test chamber will be used for forming and evaluating single- atom tips, measuring the tip properties, such as coherence and brightness, will have FIM/FEG/FEM capability, and will be bakable to 200 C. The second chamber will have nearly the same configuration, with the main application being implementation of the single-atom sources into a simple low-voltage electron microscope column.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
MRI: Acquisition of Cryo-EM for Southwest Regional Center
-
批准号:1531991
-
项目类别:Standard Grant
-
资助金额:$282.55万
-
财政年份:2015
-
负责人:John Spence
-
依托单位:
BioFEL Workshop at Lawrence Berekeley Laboratory on January 18-21, 2011.
-
批准号:1101357
-
项目类别:Standard Grant
-
资助金额:$0.5万
-
财政年份:2011
-
负责人:John Spence
-
依托单位:
Dynamics of Electron Transfer-PSI/Ferredoxin
-
批准号:1021557
-
项目类别:Standard Grant
-
资助金额:$59.02万
-
财政年份:2010
-
负责人:John Spence
-
依托单位:
Protein Beam Diffraction
-
批准号:0555845
-
项目类别:Continuing Grant
-
资助金额:$77.01万
-
财政年份:2006
-
负责人:John Spence
-
依托单位:
SGER: Serial Crystallography
-
批准号:0429814
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2004
-
负责人:John Spence
-
依托单位:
Ordering/Lithography in Glasses/Alloys
-
批准号:0245702
-
项目类别:Continuing Grant
-
资助金额:$33.25万
-
财政年份:2003
-
负责人:John Spence
-
依托单位:
Charge States in Ceramics
-
批准号:9973894
-
项目类别:Continuing Grant
-
资助金额:$33.98万
-
财政年份:1999
-
负责人:John Spence
-
依托单位:
Kinks and Surface Potentials
-
批准号:9814055
-
项目类别:Continuing Grant
-
资助金额:$29.95万
-
财政年份:1998
-
负责人:John Spence
-
依托单位:
Acquisition of Image Plate Reader and Development of Scanning Atom Probe
-
批准号:9625553
-
项目类别:Standard Grant
-
资助金额:$4.0万
-
财政年份:1996
-
负责人:John Spence
-
依托单位:
Atomistics of Kinks and Surfactants
-
批准号:9526100
-
项目类别:Continuing Grant
-
资助金额:$28.5万
-
财政年份:1995
-
负责人:John Spence
-
依托单位:
Bulk and Interface Bonding in Ceramics and Intermetallics
-
批准号:9412146
-
项目类别:Continuing Grant
-
资助金额:$27.6万
-
财政年份:1995
-
负责人:John Spence
-
依托单位:
Atomistic Processes
-
批准号:9116362
-
项目类别:Continuing Grant
-
资助金额:$24.5万
-
财政年份:1992
-
负责人:John Spence
-
依托单位:
Electron Crystallography
-
批准号:9015867
-
项目类别:Continuing Grant
-
资助金额:$20.0万
-
财政年份:1991
-
负责人:John Spence
-
依托单位:
Electron Microscopy in Surface Science
-
批准号:8813879
-
项目类别:Continuing Grant
-
资助金额:$32.42万
-
财政年份:1988
-
负责人:John Spence
-
依托单位:
Ultra High Vacuum Electron Microscopy of Surfaces and their Defects (Materials Research)
-
批准号:8512784
-
项目类别:Continuing Grant
-
资助金额:$31.52万
-
财政年份:1985
-
负责人:John Spence
-
依托单位:
Atomic Structure of Line and Planar Defects in Semiconductors (Materials Research)
-
批准号:8002108
-
项目类别:Continuing Grant
-
资助金额:$28.61万
-
财政年份:1980
-
负责人:John Spence
-
依托单位:
Quantitative Analysis of Dislocation Core Structure By High Resolution Electron Imaging and Microdiffraction
-
批准号:7722853
-
项目类别:Standard Grant
-
资助金额:$8.01万
-
财政年份:1978
-
负责人:John Spence
-
依托单位:
海外基金