Nucleation and Growth of Heteroepitaxial Diamond Thin Films on Ni Substrates

9615706 Sitar拟议的项目将研究通过热丝化学气相沉积在镍(Ni)金属衬底上异质外延成核和生长金刚石薄膜。本研究的目标是利用一种新的化学气相沉积(CVD)工艺在镍衬底上制备出面积达L×L平方厘米的高质量单晶金刚石薄膜。该工艺包括晶种、热处理、固溶处理、成核和沉积。这种多步骤CVD技术最近被证明在抑制石墨的形成和促进定向金刚石在镍衬底上的形核和生长方面非常有效。本提案将研究的问题包括：碳在原子氢存在下的溶解度，原子氢对共晶温度的影响；开发有效的晶种技术；优化多步沉积工艺；促进所需的生长方向；以及在真空中进行详细的表面表征和形核和生长过程的模拟。拟议的研究整合了最先进的设备和经验丰富的人员，进行钻石科学和技术领域的前沿研究。它将发展和扩大我们目前关于钻石生长的知识库，并提高将一项技术开发从实验室阶段转化为有用的工业应用的能力。该计划的成功实施将极大地推动这一至关重要的钻石技术的发展，并帮助美国在这一重要研究领域继续享有全球领先地位。***

9615706 Sitar The proposed project will study heteroepitaxial nucleation and growth of diamond films on nickel (Ni) metal substrates via hot filament chemical vapor deposition. The goal of this research is to produce high quality, single crystal diamond films up to an area of l x l square centimeter on Ni substrates by using a novel chemical vapor deposition (CVD) process involving seeding, annealing, solution treatment, nucleation, and deposition. This multi-step CVD technique has recently been demonstrated to be very effective in suppressing graphite formation and promoting oriented diamond nucleation and growth on Ni substrates. The issues which will be investigated in this proposal include: solubility of carbon in presence of atomic hydrogen, effect of atomic hydrogen on the eutectic temperature; developing effective seeding techniques; optimizing the multi-step deposition process; promoting desired growth orientations; and performing detailed in-vacuo surface characterization and modeling of the nucleation and growth process. %%% The proposed research integrates state-of-the-art equipment and experienced personnel to conduct forefront research in the field of diamond science and technology. It will develop and expand our current knowledge base of diamond growth and enhance the ability to transfer a technological development out of the laboratory stage into useful industrial applications. The successful implementation of this program will greatly advance this vital diamond technology and help the U. S. enjoy continuing global leadership in this important research area. ***