Acquisition of Surface Characterization Research Equipment for the Interdisciplinary Study of Materials Growth and Gas-Solid Reactions at Surfaces
Acquisition of Surface Characterization Research Equipment for the Interdisciplinary Study of Materials Growth and Gas-Solid Reactions at Surfaces
批准号:
0079690
负责人:
Tonya Klein
金额:
$19.66万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-08-15 至 2002-12-31
中文摘要
0079690克莱因这笔赠款支持设备的收购,这将提高一个多学科小组在化学工程,化学和材料科学与工程的基础领域进行研究的实力。这一建议的科学家和工程师跨学科小组对研究固体表面发生的化学有着共同的兴趣。一个高压反应室和一个化学气相沉积(CVD)室连接到一个共同的分析室将使研究小组设想的研究。这项提议是为了购置共用分析室,其中包括X射线光电子能谱仪和离子散射能谱仪。该腔室将连接到现有的CVD腔室,用于原位表征材料生长。还将连接配备有质谱仪的高压反应池,以便样品可以在反应条件下暴露于气体,随后在不暴露于空气的情况下进行分析。通过原位表面表征,可以获得生长或反应背后的科学,并且研究更加自信和完整。拟议的设备也将被用作几个本科生和研究生班的学习工具,教授实验室分析技术。 除了对研究生进行这种设备的教育外,这支调查队还致力于让本科生参与研究,以便为有前途的学生进入研究生院或从事研究和开发工作做好准备。这些本科生将有机会获得材料表征和反应工程方面的实践经验。随着我们构建器件的能力扩展到纳米尺度,了解器件构建和使用过程中发生的表面现象变得越来越重要。该奖项将用于购买一个表面分析系统,包括X射线光电子能谱仪,离子散射光谱仪和质谱仪,以研究表面的化学性质。这套强大的技术将使我们能够在三个非常重要的领域取得进展:用于高速数据存储介质的具有耐腐蚀、耐磨和抗氧化性能的纳米(10纳米)涂层,用于芯片工业的先进场效应晶体管的高介电常数薄膜,以及用于汽车燃料电池车载氢生成的催化剂开发。该分析系统将被添加到薄膜化学气相沉积系统和高压反应器单元中,以便可以在没有实验室空气和湿度污染的情况下就地制备、处理和研究材料。这体现了拟议系统的独特性。研究生和本科研究生将接受培训,使用所涉及的跨学科研究人员团队提出的系统。拟议的系统是独特的能力,但各种技术在工业中常用,因此学生研究人员将得到良好的培训,使从学术到工业职位的过渡。
英文摘要
0079690KleinThis grant supports the acquisition of equipment that will enhance the strength of a multidisciplinary group in performing research in fundamental areas of chemical engineering, chemistry, and materials science and engineering. The interdisciplinary group of scientists and engineers on this proposal has a common interest in studying the chemistry occurring at solid surfaces. A high-pressure reaction cell and a chemical-vapor deposition (CVD) chamber attached to a common analysis chamber will enable the studies envisioned by the group. This proposal is for the acquisition of the common analysis chamber, which would include X-ray photoelectron spectroscopy (XPS) and ion-scattering spectroscopy (ISS). This chamber will be attached to an existing CVD chamber for characterization of materials growth in situ. A high-pressure reaction cell equipped with a mass spectrometer will also be attached so that sample can be exposed to gases at reaction conditions and subsequently analyzed without exposure to air. With in situ surface characterization, the science behind the growth or reaction becomes obtainable and the studies more confident and complete. The proposed equipment will also be used as a learning tool in several undergraduate and graduate classes that teach laboratory analytical techniques. In addition to the education of graduate students on this equipment, this team of investigators is committed to the participation of undergraduates in research in order to prepare promising students for graduate school or a career in research and development. These undergraduates will have the opportunity to obtain hands-on experience in materials characterization and reaction engineering.As our ability to build devices extends into the nanometer dimension, understanding the surface phenomena occurring during the device building and use is becoming increasingly important. This award will be used to purchase a surface analysis system comprising of X-ray photoelectron spectroscopy, ion scattering spectroscopy and a mass spectrometer in order to study the chemical nature of surfaces. The powerful set of techniques will enable us to make advances in three very important areas; ultrathin (10 nanometer) coatings for high speed data storage media that exhibit resistance to corrosion wear and oxidation, ultrathin high-dielectric-constant films for advanced field effect transistors used in the chip industry and catalyst development for on board generation of hydrogen in automobile fuel cells. The analysis system will be added to a thin film chemical vapor deposition system and a high-pressure reactor cell so that materials may be prepared, treated and studied in-situ without the contamination of laboratory air and humidity. This represents the unique nature of the proposed system. Graduate and undergraduate research students will be trained to use the proposed system by the interdisciplinary team of researchers involved. The proposed system is unique in its abilities but the various techniques are commonly used in industry and therefore the student researchers will be well trained to make the transition from academic to industrial positions.
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CAREER: Deposition of Metal and High K Dielectric Thin Films by Plasma Enhanced Atomic Layer Deposition for Research and Education
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批准号:0239213
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项目类别:Standard Grant
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资助金额:$40.56万
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财政年份:2003
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负责人:Tonya Klein
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依托单位:
Remote Plasma Enhanced Organometallic Chemical Vapor Deposition of High Permittivity Dielectrics
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批准号:0084703
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项目类别:Standard Grant
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资助金额:$17.99万
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财政年份:2000
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负责人:Tonya Klein
-
依托单位:
国内基金
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