MRI: High Aspect Ratio Etching System for Micro and Nanoscale Sensor and Sensor Systems Applications

该主要研究仪器（MRI）奖为电感耦合等离子体蚀刻系统提供资金，该系统由三个工艺模块组成：(i)先进的硅蚀刻模块，用于高蚀刻速率、高纵横比的硅蚀刻；（ii）氧化物蚀刻模块，用于石英、二氧化硅和其他陶瓷材料的高纵横比蚀刻；（iii）用于高选择性硅的各向同性化学蚀刻的二氟化氙气相蚀刻模块。该仪器将被宾夕法尼亚州立大学10个学术部门的超过25个研究小组用于微流体，生化传感器，高速开关和射频应用的纳米级谐振器领域的研究，高性能压电和聚合物薄膜集成到硅微系统以及纳米级基本量子力学效应的研究。它还将用于开发微制造技术的本科和研究生水平的实验课程，作为微纳米系统技术课程的一部分。提出的工具配置将允许宾夕法尼亚州立大学的研究人员开发新型传感器、致动器和电子系统，应用范围从生物医学技术到国土安全。除了促进跨学科研究外，该工具还将为学生提供动手制造经验，并将有助于培养在微纳米尺度科学和技术领域熟练的劳动力。先进的蚀刻能力和独特的蚀刻工艺将吸引新的研究合作与工业和国家实验室到宾夕法尼亚州立大学。蚀刻工具也将影响目前为K-12学生提供的纳米科学和纳米技术纳米营和芯片营项目。

This Major Research Instrumentation (MRI) award provides funding for an inductively coupled plasma etching system consisting of three process modules: (i) advanced silicon etch module for high etch-rate, high aspect ratio etching of silicon; (ii) oxide etch module for high aspect ratio etching of quartz, silicon dioxide, and other ceramic materials; and (iii) a xenon difluoride vapor phase etching module for isotropic chemical etching of silicon with high selectivity. The instrument will be used by more than 25 research groups in 10 academic departments at Penn State University to conduct research in the areas of microfluidics, biochemical sensors, high-speed switches and nanoscale resonators for radio frequency applications, integration of high-performance piezoelectric and polymeric thin films into silicon microsystems and investigation into fundamental quantum mechanical effects at the nanoscale. It will also be used to develop undergraduate and graduate level laboratory courses in microfabrication techniques as part of a course curriculum in micro and nanosystems technology.The proposed tool configuration will allow researchers at Penn State to develop novel sensors, actuators, and electronic systems for applications ranging from biomedical technology to homeland security. In addition to fostering interdisciplinary research, the tool will provide hands-on fabrication experience to students and will be instrumental in the creation of a workforce skilled in the areas of micro and nanoscale science and technology. The advanced etching capability with the uniquely developed etching processes will attract new research collaborations with industry and national laboratories to Penn State University. The etch tool will also impact the nano-camp and chip-camp programs currently offered for K-12 students on nanoscience and nanotechnology.