Deep X-Ray Lithography for High Aspect Ratio Polymer Micro Structures

高深宽比聚合物微结构的深度 X 射线光刻

• 批准号: RGPIN-2019-06009
• 负责人: Achenbach, Sven
• 金额: $ 1.97万
• 依托单位: University of Saskatchewan
• 依托单位国家: 加拿大
• 项目类别: Discovery Grants Program - Individual
• 财政年份: 2021
• 资助国家: 加拿大
• 起止时间: 2021-01-01 至 2022-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=738654
• 关键词: Deep; Ray; Lithography; Aspect; Ratio

Micro-electro-mechanical systems (MEMS) increasingly replace macroscopic devices for improved performance. Many MEMS processes to date are silicon-based and support a planar architecture. Extending the materials selection and increasing the structural height to enable a vertical-wall architecture would allow, e. g., higher throughput micro reactors or higher sensitivity micro sensors. Deep X-ray lithography (XRL) can theoretically produce such high quality polymer or metal microstructures. They can have a large structural height (up to millimeters) and optically smooth, vertical sidewalls. The aspect ratio, defined as the structural height relative to the minimum lateral dimensions, can exceed 100:1. XRL, however, requires synchrotron radiation from an electron storage ring and is an extremely complex process. Its full potential is far from being reached, and XRL therefore still remains a niche technology with limited availability. The overarching question of my research is how we can contribute to fundamental improvements of XRL process technologies to allow for widespread application in the fabrication of high quality micro devices. This drives my objectives over the next 5 years to innovate XRL processing by developing high quality and rapid prototyping XRL mask making processes, and to apply these capabilities in the microfabrication of advanced X-ray optical elements and radio frequency (RF) MEMS. To achieve these goals, we will use the world-unique capabilities of my lab SyLMAND, the Synchrotron Laboratory for Micro and Nano Devices at the Canadian Light Source in Saskatoon, which I had designed to overcome pre-existing bottlenecks in XRL process capabilities and which started operations last year. Pursuing our goals is also based on our recently developed disruptive new XRL mask fabrication technology to improve fabrication timelines and cost by about an order of magnitude. We will develop a high resolution XRL mask technology that increases the achievable lateral resolution and vertical structure height of our XRL devices by about an order of magnitude each. This is a precondition to innovate X-ray optical elements using XRL techniques to focus synchrotron radiation for analysis in basic science and technology. Applications areas of such ultra high aspect ratio refractive lenses and zone plates include environmental and biological sciences and material design. Another outcome will be the fabrication of vertical wall RF MEMS components where smooth, high aspect ratio sidewalls are utilized to collaboratively develop wireless devices. We will demonstrate an advanced integrated, compact mm-wave artificial antenna array suitable for the emerging 5G wireless application standard used in, e.g., next-generation cell phones. In executing this research program, 7 HQP will be trained to fill demand of experts in key technologies such as materials development and communications technologies.

微机电系统（MEMS）越来越多地取代宏观器件以提高性能。迄今为止，许多MEMS工艺都是基于硅的，并且支持平面架构。扩大材料选择和增加结构高度，使垂直墙建筑将允许，e。例如，在一个实施例中，更高通量的微反应器或更高灵敏度的微传感器。理论上，深X射线光刻（XRL）可以产生这种高质量的聚合物或金属微结构。它们可以具有大的结构高度（高达毫米）和光学平滑的垂直侧壁。纵横比（定义为结构高度相对于最小横向尺寸）可以超过100：1。然而，XRL需要来自电子存储环的同步辐射，并且是一个极其复杂的过程。它的全部潜力还远未得到充分发挥，因此XRL仍然是一种可用性有限的利基技术。我的研究的首要问题是我们如何能够为XRL工艺技术的根本改进做出贡献，以便在高质量微型器件的制造中广泛应用。这促使我在未来5年内通过开发高质量和快速原型XRL掩模制作工艺来创新XRL处理，并将这些能力应用于先进X射线光学元件和射频（RF）MEMS的微制造。为了实现这些目标，我们将使用我的实验室SyLMAND的世界独特的能力，这是萨斯卡通加拿大光源的微纳米器件同步加速器实验室，我设计它是为了克服XRL工艺能力中预先存在的瓶颈，并于去年开始运营。追求我们的目标也是基于我们最近开发的颠覆性的新XRL掩模制造技术，以改善制造时间表和成本约一个数量级。我们将开发一种高分辨率XRL掩模技术，将XRL器件的横向分辨率和垂直结构高度分别提高约一个数量级。这是利用XRL技术创新X射线光学元件以聚焦同步辐射用于基础科学和技术分析的前提。这种超高纵横比折射透镜和波带片的应用领域包括环境和生物科学以及材料设计。另一个成果将是垂直壁RF MEMS组件的制造，其中利用平滑、高纵横比的侧壁来合作开发无线设备。我们将展示一种先进的集成紧凑型毫米波人造天线阵列，适用于新兴的5G无线应用标准，例如，下一代手机在执行这项研究计划时，将培训7名HQP，以满足材料开发和通信技术等关键技术专家的需求。