Support of the 15th International Conference on Molecular Beam Epitaxy; Vancouver, Canada; August 2008

技术。分子束外延（MBE）国际会议将于2008年8月3日至8日在加拿大温哥华的英属哥伦比亚大学举行。会议的范围很广，涵盖了MBE的整个领域。会议的重点是MBE生长、加工和表征的材料方面，但会议也包括相关的物理和器件性能的所得薄膜和结构。会议主办方安排了3场全体会议、14场特邀会议和约250篇关于mbe相关研究最新成果的论文，以提供一个刺激和广泛的知识环境。非技术。会议提供了一个很好的论坛，大学，政府和工业科学家之间的互动，在这些和相关主题的工作。所要求的旅费和会议费用支助的目的是更好地将代表性不足的群体成员纳入与电子材料有关的领域。除了有机会评估该领域和未来方向外，预计还将在大学、研究机构和产业界之间建立新的联系。

Technical. An International Conference on Molecular Beam Epitaxy (MBE) will be held during the week of August 3-8, 2008 at the University of British Columbia, Vancouver, Canada. The scope of the conference is broad, covering the entire spectrum of MBE. The focus is on the material aspects of MBE growth, processing and characterization, but the conference also includes relevant physics and device properties of resulting films and structures. The conference organizers have scheduled three plenary talks, fourteen invited talks, and ~250 contributed papers on the latest results on MBE-related research to provide a stimulating and wide-ranging intellectual environment. Non-technical. The conference provides an excellent forum for interaction between university, government and industrial scientists working on these and related topics. The travel and conference fee support requested is targeted to improve the inclusion of members of under-represented groups in fields related to electronic materials. Along with the opportunity to assess the field and future directions, it is expected that new ties will be established among universities, research institutions, and industry.