Surface Chemical Functionalization of Semiconductors and Nanostructures

该奖项是根据2009年美国复苏和再投资法案（公法111-5）资助的。”化学系的分析和表面化学（ASC）项目支持德克萨斯大学达拉斯分校Yves Chabal教授的研究项目。Chabal教授和他的学生将研究具有重要技术意义的半导体表面和纳米结构的表面化学和化学功能化。该小组将使用表面红外光谱，可以说是最具鉴别性和通用的技术来获得化学和结构信息，结合光谱椭偏，拉曼和x射线光电子能谱和原子力显微镜来研究Ge， SiC和其他III-V半导体表面的化学过程。该研究将与几个理论小组密切合作，以详细了解反应途径和产物结构。该研究将为学生提供在化学和半导体加工行业非常感兴趣的跨学科领域进行培训的独特机会。Chabal教授和他的学生将为UTD的各种活动做出贡献，旨在增加来自科学领域代表性不足群体的学生人数。

This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)." The Analytical and Surface Chemistry (ASC) program of the Division of Chemistry supports the research program of Professor Yves Chabal of the University of Texas at Dallas. Prof. Chabal and his students will examine the surface chemistry and chemical functionalization of technologically important semiconductor surfaces and nanostructures. The group will employ surface infrared spectroscopy, arguably the most discriminating and versatile technique to derive chemical and structural information, in conjunction with spectroscopic ellipsometry, Raman and X-ray photoelectron spectroscopy and atomic force microscopy to study chemical processes on Ge, SiC and other III-V semiconductor surfaces. The study will be carried out in close collaboration with several theory groups in order to develop detailed understanding of the reaction pathways and product structures. The study will provide students with a unique opportunity to train in an interdisciplinary field which is of great interest to the chemical and semiconductor processing industries. Prof. Chabal and his students will contribute to various activities at UTD aiming to increase the number of students from under represented groups in science.