EAGER: Quantum Manufacturing: 3D Microfabricated Ion Traps

工程量子设备有望彻底改变通信、传感和计算，但如果要对现实世界的问题有用，这些系统的尺寸必须增加几个数量级。特别是，捕获原子离子是量子信息处理的主要平台。这些离子被捕获在直流和射频电位中，用激光控制，并进行光学测量。然而，目前的离子捕获方法面临着可扩展性和捕获质量之间的权衡（例如，捕获电位的深度和均匀性）。这项探索性研究（EAGER）量子制造奖的早期概念资助支持开发一种新的离子阱架构，在不牺牲可制造性的情况下提供电气和光学控制。硅制造技术将探索创造增加光学访问的电极，多晶圆对准和键合工艺将提高陷阱质量，薄聚焦光学将直接制造并与陷阱电极对齐。这些进步将使捕获、控制和测量跨越厘米级装置的数千个单个离子成为可能。这项工作代表了定义捕获离子量子计算机制造过程的第一步。此外，不断发展的量子产业将需要训练有素的劳动力来设计、制造和测试这些下一代设备。通过参与研究，学生将获得相关技能的培训，并培养量子素养。将特别努力与华盛顿大学的现有努力相结合，扩大代表性不足的人口的参与。该项目旨在开发一种制造工艺，能够可靠地集成高保真、可扩展的量子计算所需的电子和光学元件，并利用捕获离子，缩小捕获特性与设计可扩展性之间的差距。研究将集中于开发一种可重复的离子阱制造工艺，同时具有高阱深度、电压效率和光通路。研究和发展先进的硅制造技术将实现悬垂电极和背面布线。多层晶圆陷阱将提供高质量的陷阱电位，静电模拟将为制造公差提供信息。最后，将设计平面聚焦光学元件，以改善收集和控制，并通过在晶圆捕获电极两侧的手柄晶圆直接图像化，以光刻方式对准电极。该奖项反映了美国国家科学基金会的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。

Engineered quantum devices promise to revolutionize communication, sensing, and computation, but these systems must increase in size by orders of magnitude if they are to be useful for real-world problems. In particular, trapped atomic ions are a leading platform for quantum information processing. These ions are trapped in dc and rf electric potentials, controlled with lasers, and measured optically. However, current approaches to ion trapping face a tradeoff between scalability and trap quality (e.g., the depth and uniformity of the trapping potential). This EArly-concept Grant for Exploratory Research (EAGER) Quantum Manufacturing award supports development of a new ion trap architecture providing both electrical and optical control, without sacrificing manufacturability. Silicon fabrication techniques will be explored to create electrodes that increase optical access, a multi-wafer alignment and bonding process will improve trap quality, and thin focusing optics will be directly fabricated and aligned with the trapping electrodes. These advancements will enable trapping, controlling, and measuring thousands of individual ions across a centimeter-scale device. This work represents the first steps towards defining the manufacturing process for a trapped ion quantum computer. Additionally, the growing quantum industry will need a trained workforce to design, build, and test these next-generation devices. By participating in the research, students will be trained in pertinent skills and develop a quantum literacy. Special effort will be made to broaden participation of underrepresented populations by joining with existing efforts at the University of Washington.This project aims to develop a manufacturing process capable of reliably integrating electrical and optical components necessary for high fidelity, scalable quantum computing with trapped ions, closing the gap between the trapping characteristics and the scalability of the design. Research will focus on development of a reproducible fabrication process for ion traps with simultaneously high trap depth, voltage efficiency, and optical access. Research in and development of advanced Silicon fabrication techniques will achieve overhanging electrodes and backside routing. Multi-layer wafer traps will provide high quality trapping potentials, and electrostatic simulations will inform manufacturing tolerances. Finally, planar focusing optics for improved collection and control will be designed and lithographically aligned to electrodes by direct patterning of handle wafer on either side of the wafer trapping electrodes.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.