Double Exposure Photoresists for the 32 and 22 nm Lithographic Nodes

半导体产业是世界上最大的产业之一，年收入达到2200亿美元，在全球拥有150多万员工。该项目为澳大利亚双重曝光光刻领域的重要专业知识的发展提供了一个独特的机会。所开发的新型光活性聚合物薄膜有望支持下一代微芯片。该项目的一个主要成果将是确立澳大利亚在这一迅速发展的领域的世界领先地位。此外，该技术可广泛应用于许多印刷技术。

The semiconductor industry is one of the largest world-wide, with annual revenue of $220B and employing over 1.5M people around the world. This project provides a unique opportunity for development within Australia of significant expertise in the field of double exposure lithography. The novel photoactive polymeric films to be developed are expected to support the next generation of microchips. A major outcome of this project will be establishment of Australia as a world-leader in this rapidly expanding field. Furthermore the technology can be applied broadly to many printing technologies.