Production of specific 3D nano-particles and nano-structures for the development of an automated optical characterization using high-resolution interference microscopy

该项目是关于在微米和纳米范围内弯曲结构的生产和干涉表征。使用纳米压印光刻（NIL）和测量使用一种新的表征方法的基础上林尼克白光干涉仪的结构。其目的是将NIL工艺的各种形状和材料扩展到复杂的3D结构，并建立一种快速，非接触但高分辨率的方法，即使是困难的几何形状也可以测量。在开发测量设置和方法时，使用具有定义几何形状和材料的选定结构。通过这种方式，两个工作组相互补充，并形成了有益的协同效应。在项目的第一阶段，已经展示了使用各向同性干法蚀刻生产半椭圆体结构。此外，建立了一种通过精密多次压印来制备3D金属结构的NIL工艺。为了表征结构，开发并实施了基于Linnik干涉仪的“自适应”测量概念。使用具有与测量对象的几何形状相适应的几何形状的参考对象，它可以检测纳米范围内的偏差。这些可以通过使用内部开发的软件进行访问和评估。这里提出的更新建议与第一个供资期已经取得的成果直接相关。利用衬底共形纳米压印技术，可以在弯曲的半椭球体结构上制作金属结构。一方面，这是为了生产混合材料结构，另一方面，子结构可以通过NIL在曲面上进行，从而为几何要求高的结构开辟了新的道路。重点将是我。a.生产一种特殊的SCIL印模，防止残留层在压印过程中固化。测量一种结构的不同尺寸部分和不同材料的组合也是干涉测量系统的巨大挑战。我们的目标是采用自适应的概念，以更广泛的各种测量几何形状和规模。一个重点在于沉浸目标的整合。这提供了可能性，以提高系统的分辨率，并在同一时间获得新的详细的洞察力在浸没介质中的干涉测量的行为。此外，该系统应该升级，以便即使在UV照射下也受益于偏振相关效应。

This project is about the production and interferometric characterization of curved structures in the micro- and nanometer range. The structures are produced using nanoimprint lithography (NIL) and measured using a novel characterization method based on a Linnik white-light interferometer. The aim is to expand the NIL process with regard to the variety of shapes and materials to complex 3D structures and to establish a fast, non-contact but high-resolution method, with which even difficult geometries can be measured. When developing the measurement setup and methodology, selected structures with defined geometries and materials are used. In this way, both working groups involved complement each other and develop beneficial synergies.In the first phase of the project, the production of semi-ellipsoidal structures using isotropic dry etching was already demonstrated. Furthermore, a NIL process to produce 3D metal structures through precise multiple imprinting was established. To characterize the structures, an “adaptive” measurement concept based on a Linnik interferometer was developed and implemented. Using a reference object with a geometry that is adapted to the geometry of the measuring object it can detect deviations in the nanometer range. These can be accessed and evaluated by use of an in-house developed software. The renewal proposal presented here connects directly to the results already achieved in the first funding period. Via substrate conformal nanoimprint lithography (SCIL), metal structures are supposed to be fabricated on top of curved semi-ellipsoidal structures made of polymer. On the one hand, this is aimed at the production of hybrid material structures, on the other hand, a sub-structuring can take place by NIL on curved surfaces and thus opens up new paths towards geometrically demanding structures. The focus will be i. a. on producing a special SCIL stamp that prevents the residual layer from curing during the imprint process.The measurement of differently scaled parts of one structure and the combination of different materials is also a huge challenge for the interferometric measurement system. The goal is to adopt the adaptive concept to a broader variety of measurement geometries and scales. One focus lies on the integration of immersion objectives. This provides the possibility to enhance the resolution of the system and at the same time gain new detailed insight in the behaviour of interferometric measurements in immersion media. Additionally, the system is supposed to be upgraded in order to benefit from polarization dependent effects even under UV-illumination.