ICP Plasma Etching System

这里提出的ICP等离子体蚀刻系统补充了萨尔兰大学量子光学组的基础设施，该系统具有用于金刚石中微结构和纳米结构加工的强烈要求的设备。这种结构的制造，使实验上的颜色中心在钻石中的光子晶体结构中的光学腔的耦合，实现自旋光子接口的钻石中的颜色中心，并需要制造的光学纳米天线的颜色中心和制造的扫描探针结构在钻石中的磁力与高空间分辨率。这些实验只能在给定由ICP等离子体蚀刻系统提供的制造平台的情况下进行。这里提到的研究课题的长期目标是在单量子系统水平上探索光-物质相互作用的基本效应，以及为量子技术中的应用提供固态系统（如钻石中的色心）和单光子。我们致力于进一步开发新的应用潜力，例如在安全通信（量子通信）或高灵敏度测量技术（量子传感）领域。后者是新的欧盟量子技术旗舰的中心专栏，因此有助于最近的研究课题。

The ICP plasma etching system proposed here complements the infrastructure of the Quantum Optics group at Saarland University with a strongly required device for processing of micro- and nanostructures in diamond. Fabrication of such structures enables experiments on coupling of color centers in diamond to optical cavities in photonic crystal structures, on realization of spin-photon interfaces for color centers in diamond, and is required for fabrication of optical nano-antennas for color centers and for fabrication of scanning probe structures in diamond for magnetometry with high spatial resolution. These experiments can only be conducted given the fabrication platform provided by an ICP plasma etching system. Long term goals of the research topics mentioned here are both the exploration of fundamental effects of light-matter interaction at the level of single quantum systems and the supply of solid-state systems (such as color centers in diamond) and single photons for applications in quantum technologies. We strive for further development of new application potential, e.g. in fields of secure communication (quantum communication) or highly sensitive measurement technologies (quantum sensing). The latter fields are central columns of the new EU quantum technologies flagship and thus contribute to highly recent research topics.