Fabrication and analysis of 3-dimensional structure with nano-particles by nano-explosion of metal oxide thin film

分析了激光聚焦位置与纳米爆炸金属氧化物薄膜凹坑形成的关系。从本实验中可以看出，聚焦点的位置控制对于纳米爆炸制备纳米坑是非常重要的，因为与聚焦点的强度分布相比，氧化铂膜的热物性非常敏感。这种灵敏度对于在夹有介质薄膜的多层氧化铂薄膜中通过焦位移位来制备三维结构是非常重要的。利用传统的磁盘驱动器测试仪制作了150 nm尺寸的铂纳米颗粒凹坑，设计了一种利用介质层夹层铂层纳米爆炸的光子晶体制作的光波导器件，并计算了其效应。设计了包括纳米金属颗粒在内的纳米网点偏振器，并对其效果进行了评估。通过这些计算表明，利用这种技术制造光学元件是有可能的。为了制造出高深宽比的纳米结构，评估了纳米爆炸作为干法刻蚀掩模的纳米点的性能。为了选择材料，有可能在纳米孔和空间之间提供很大的不同的刻蚀速率。因此，成功地制备了高深宽比(100 nm宽，500 nm深)的纳米结构。从这些结果可以认为，利用所提出的金属氧化物薄膜的纳米爆炸来实现微小凹坑结构的加工工艺是足够的。希望通过这项技术推动器件的改进，并推动未来光学器件的发展。

The relation between the focus position of laser beam and the pit formation by nano-explosion of metal-oxide thin film was analyzed. From this experiment, it is clear that the focus position control is very important to fabricate the nano-pits by nano-explosion, because the thermal property of platinum oxide film is very sensitive as compared with the intensity distribution in the focus spot. This sensitivity is very important to fabricate the 3-dimentional structure by focus position shift in the multi stacked platinum oxide thin film sandwiched by dielectric thin layers. The 150 nm size pits with platinum nano-particles were fabricated using a conventional disk drive tester.I designed the wave guide using the photonic crystal which was possible to fabricate by nano-explosion of platinum oxide layer sandwiched by dielectric layers and calculated its effect. I also designed the polarizer using nano-dots including nano metal-particles and estimated its effect. It became clear there was a possibility that the optical component was able to be made from this technique by these calculations.To make a nano-structure with high-aspect ratio, the property of nano-dots by nano-explosion as mask of a dry etching was estimated. To select the material, it was possible to give a large different etching rate between nano-hole and space. Therefore, it succeeded in making the nano-structure of a high aspect ratio (100 nm width, 500 nm depth).It is thought that the processing technology of the minute pit structure to use the nano-explosion of the proposed metallic oxide thin film was able to be established enough from these results. It wants to advance the improvement of the device, and to advance the optical device development by this technique in the future.