Electron-beam lithography system

通过本申请，我们申请了一种用户友好的高空间分辨率电子束光刻系统。该系统将使申请者的工作组能够试验性地实施广泛的复杂纳米系统。一个重要的工作重点应该是制备光子和光电子混合纳米结构。这里要实现的纳米结构是多样的，包括例如发光的、非线性的和可切换的光子亚表面、混合量子系统、基于二维材料和纳米线的光电子系统、以及用纳米结构响应材料装饰的光子系统。另一个工作重点是开发新的纳米材料和纳米结构工艺，例如开发对电子束敏感的响应性聚合物、特殊柔性玻璃和纳米结构离子交换表面。所应用的系统是基于计算机优化设计的混合纳米结构控制制造的理想工具。特别是，还应实现由两个或更多精确排列的层和/或不同材料体系组成的复杂纳米结构。这种精确的控制对于混合光子纳米结构尤其重要，其功能是基于光学共振结构与纳米级物质的选择性近场相互作用。为此，所请求的系统实现了多阶段曝光过程，该多阶段曝光过程可以使用干涉样品平台以低于10 nm的精度彼此对准。该系统的另一个优点是对非常小或不规则尺寸的样品的曝光具有很高的灵活性。这使得新材料和/或层状体系的纳米结构成为可能，这些材料和/或层状体系只有少量可用。因此，所要求的系统非常适合于新的光学和响应材料系统和新的纳米结构工艺的方法开发。申请的系统将主要由弗里德里希·席勒大学(FSU)耶拿的五个研究小组使用，这些小组设在物理和天文学学院以及化学和地球科学系，但原则上应向FSU所有感兴趣的研究小组开放。特别是，该系统将使使用该系统的研究小组之间能够进行各种新的跨学科协作。总而言之，所要求的系统将大大加强位于光学和材料科学两个焦点的耶拿联邦大学的科学光谱。

With the present application we apply for a user-friendly electron beam lithography system with high spatial resolution. The system will enable the applicants' working groups to experimentally implement a wide range of complex nanosystems. An important work focus should be on the fabrication of hybrid photonic and optoelectronic nanostructures. The nanostructures to be realized here are diverse and include for example light-emitting, non-linear and switchable photonic meta-surfaces, hybrid quantum systems, optoelectronic systems based on two-dimensional materials and nanowires, and photonic systems that are decorated with nanostructured responsive materials. Another focus of work is the development of new nanomaterials and nanostructuring processes, such as the development of electron-beam-sensitive responsive polymers, special flexible glasses and nanostructured ion-exchanged surfaces. The system applied for is the ideal tool for the controlled fabrication of hybrid nanostructures based on designs optimized on the computer. In particular, complex nanostructures, which consist of two or more precisely aligned layers and / or different material systems, should also be realized. This precise control is particularly important for hybrid photonic nanostructures, whose functionality is based on a selective near-field interaction of an optically resonant structure with nanoscale matter. For this purpose, the requested system enables multi-stage exposure processes that can be aligned with one another with an accuracy of sub 10 nm using an interferometric sample stage. Another strength of the system is its high flexibility for the exposure of samples with very small or irregular dimensions. This enables the nanostructuring of new materials and / or layered systems that are only available in small quantities. The requested system is therefore ideally suited for method development of new optical and responsive material systems and new nanostructuring processes. The system applied for will be mainly used by five research groups from the Friedrich Schiller University (FSU) Jena, which are based at the Faculty of Physics and Astronomy and the Faculty of Chemistry and Geosciences, but shall in principle be made accessible for all interested research groups of the FSU. In particular, the system will enable various new interdisciplinary collaborations between the research groups using it. All in all, the requested system will significantly strengthen the scientific spectrum of the FSU Jena at the intersection of the two focal points optics and materials science.