Studies on the application of polymeric materials containing thymine photodimer to the electron beam resists.

研究了含胸腺嘧啶光二聚体的核酸聚合物作为微光刻电子束抗蚀剂材料。研究了核酸聚合物的光化学反应，并将其应用于深紫外光抗胶材料，获得了高分辨率的图像。我们还发现核酸聚合物也可以应用于电子束光刻。其中一种核酸聚合物是聚碳酸酯，在聚合物主链上含有胸腺嘧啶光二聚体和叔醇单元。本文研究了含嘧啶单元的酸敏聚合物的制备，以及电子束作为化学放大抗蚀剂与酸发生器或无酸发生器的反应。用羰基二咪唑将胸腺嘧啶光二聚体的二醇衍生物与各种二醇缩合，得到了随机聚碳酸酯和交替聚碳酸酯。研究了含胸腺嘧啶光二聚体的聚碳酸酯在薄膜状态下的光解反应。用旋流机将其溶解在有机溶剂中得到薄膜，浇铸在硅片上。用紫外分光光度计在270 nm处进行光化学反应，通过聚合物解离吸收再生的胸腺嘧啶单元。经预焙后，用电子束照射至光化学反应完全。在三苯磺酸的情况下，观察到交替共碳酸酯的灵敏度和伽马值的增加。除了具有高灵敏度和高分辨率外，该聚合物还可以用TMAH碱溶液开发而不膨胀。

Nucleic acid polymers containing thymine photodimer were studied as an electron beam resist material for microlithography. Photochemical reactions of the nucleic acid polymers have been studied and applied as Deep-UV photoresists materials, which gave high resolution pattem. We also found that the nucleic acid polymers can also be applied as electron beam (EB) lithography. One of the nucleic acid polymers is a polycarbonate containing both thymine photodimer and tertiary alcohol units in the polymer main chain. This study deals with preparations of the acid sensitive polymer containing pyrimidine units, and the reaction by electron beam with or without acid generator as an chemical amplified resist.The diol derivative of thymine photodimer were condensed with various diols using carbonyl diimidazole to give both random and altemating polycarbonates. Photolyses of the polycarbonates containing thymine photodimer units were carried out in film state. Thin films were obtained from their solution in organic solvent using spinner, casting on the silicon wafer. Photochemical reaction was followed by UV spectrophotometer at 270 nm which was absorption of the regenerated thymine units by dissociation of the polymer. After prebaking, the fihns were exposed to irradiation of electron beam until complete photochemical reaction.Increase of sensitivity and gamma values in the presence of triphenylsulfonium trifulate in the case of altemating copolycarbonate was observed. In addition to this high sensitivity and high resolution, this polymer can be developed with TMAH alkali solution without swelling.