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Sub-10nm hard X-ray focusing and application to nanoscopy/spectroscopy

Sub-10nm hard X-ray focusing and application to nanoscopy/spectroscopy
亚10nm硬X射线聚焦及其在纳米显微镜/光谱学中的应用
批准号:
18002009
负责人:
YAMAUCHI Kazuto
金额:
$168.23万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Specially Promoted Research
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2010

项目摘要

项目成果

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中文摘要
翻译
为了进一步提高x射线显微成像的空间分辨率,研制了一种亚10nm硬x射线聚焦系统。根据波光学理论,完成了硬x射线原位波前误差测量和误差补偿方法。在SPring-8上实现了世界上第一个亚10nm光束。然后,将聚焦系统升级为x射线纳米/光谱学。成功地观察到纳米厚度的Pt薄膜,其空间分辨率优于10nm。
英文摘要
In order to further improve the spatial resolution in X-ray microscopy, a sub-10nm hard X-ray focusing system was developed. In situ hard X-ray wavefront error measurement and error compensation methods were completed, following wave-optical theory. The world-first sub-10nm beam was realized at SPring-8. Then, the focusing system was upgraded to X-ray nanoscopy/spectroscopy. A nanometer-thickness films made of Pt was successfully observed with better than 10nm spatial resolution.
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会议论文
Development and application of high-resolution diffraction microscopy using synchrotron x-ray beam focused Kirkpatrick-Baez mirrors
使用同步加速器X射线束聚焦柯克帕特里克-贝兹镜的高分辨率衍射显微镜的开发和应用
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [Y.Takahashi, Y.Nishino, R.Tsutsumi, H.Kubo, H.Furukawa, H.Mimura, S.Matsuyama, N.Zettsu, T.Ishikawa, K.Yamauchi]
通讯作者: K.Yamauchi
High-resolution diffraction microscopy using synchrotron X-ray beam focused by Kirkpatrick-Baez mirrors
使用柯克帕特里克-贝兹镜聚焦的同步加速器 X 射线束的高分辨率衍射显微镜
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [Y.Takahashi, Y.Nishino, R.Tsutsumi, H.Kubo, H.Furukawa, H.Mimura, S.Matsuyama, N.Zettsu, T.Ishikawa, K.Yamauchi]
通讯作者: K.Yamauchi
Development and application of coherent x-ray diffraction microscopy at SPring-8
SPring-8 相干 X 射线衍射显微镜的开发和应用
DOI: --
发表时间: 2010
期刊:
影响因子: --
作者: [新田貴彦, 杉崎聡, 岡留智史, 長谷川佳, 高口洋人, Y.Takahashi]
通讯作者: Y.Takahashi
One-dimensional Wolter optics with a sub-50-nm spatial resolution.
空间分辨率低于 50 nm 的一维 Wolter 光学器件。
DOI: --
发表时间: 2010
期刊: Optics Letters
影响因子: 3.6
作者: [M.Akita, S.Yoshida, T.Morimoto, T.Ushio, Z.Kawasaki, 松山智至]
通讯作者: 松山智至
共 151 条
    Substrate surface modification by ion beam irradiation-Deposition of a polycrystalline silicon at a low temperature-
    • 批准号:
      07555040
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $3.01万
    • 财政年份:
      1995
    • 负责人:
      YAMAUCHI Kazuto
    • 依托单位:
    A high sensitive evalution method for Si surface crystallografic properties by employing surface photovoltage effects.
    • 批准号:
      06650143
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.47万
    • 财政年份:
      1994
    • 负责人:
      YAMAUCHI Kazuto
    • 依托单位:
    海外基金