Developing Semi-Insulating Silicon Carbide Epitaxy

微电子器件技术-物理科学该项目旨在开发用于射频和微波电子工业的碳化硅（SiC）半绝缘材料。它将包括材料表征和设备构建，所有这些都使用华威大学的设施。建造碳化硅半绝缘材料的特殊方法是在华威材料工厂引入新的前体，由华威现有员工执行。学生将开发表征技术来定义一个厚的半绝缘层使用显微镜和基本的电测试。连锁效应必须控制在不转移到系统中制造的其他材料的情况下（例如，自掺杂，记忆效应，扩散性，分离等）。这将经历许多循环，学生将通过诸如控制方法的纯度、前驱体、压力、质量流量、温度等参数来改进材料制造系统。然后，学生将利用标准的构建过程在开发的平台上构建设备。这将导致新的技术，这可能包括在许多射频和微波电子领域。

Microelectronic device technology - Physical SciencesThe project aims to develop Silicon Carbide (SiC) semi-insulating materials for application in the RF and microwave electronics industry. It will consist of materials characterisation and device construction, all using facilities at Warwick. The particular method to construct SiC semi-insulating materials is by the introduction of new precursors in the materials facility Warwick, to be performed by existing Warwick staff. The student will develop the characterisation techniques to define a thick semi-insulating layer using microscopy and basic electrical testing. Knock-on effects must be controlled without transferring to other materials made in the system (e.g. autodoping, memory effect, diffusivity, segregation etc.). This will undergo many loops with the student contributing to improving the material fabrication system by parameters such as purity of control methodology, precursor, pressure, mass flow, temperature etc. Then, the student will construct devices on the developed platform utilising a standard construction process. This will result in new technologies, which could be included in many RF and microwave electronics areas.