Micro/nano fabrication of x-ray optics for phase-contrast imaging

在过去的两年里，我们取得了进展。第一个是制作第一个周期为200 nm的硬X射线光栅，可以用来构建高灵敏度的X射线相衬成像装置；第二个是开发用于台式系统的质量更高、成本更低的第二代光栅。第一个里程碑是在与教授的合作下达成的。宾夕法尼亚州立大学的道格拉斯·沃尔夫与弗朗西斯科·德卡洛博士合作，在阿贡国家实验室高级光子源的2-BM-B光束线上领导了一个超灵敏成像系统。第二个里程碑是与NIST国家科学技术中心的纳米制造设施合作实现的。第二代光栅正在我们美国国立卫生研究院的实验室进行测试。

In the past two years we accomplished advances. The first is to create the first hard x-ray gratings of 200 nm period that can be used to construct a highly sensitive x-ray phase contrast imaging device; the second is to develop the second generation gratings of higher quality and much reduced cost for use in bench-top systems. The first milestone was reached in collaboration with prof. Douglas Wolfe of Penn State University, leading to an ultra-sensitive imaging system on the 2-BM-B beamline of the Advanced Photon Source of Argonne National Laboratory in collaboration with Dr. Francesco De Carlo. The second milestone was reached in collaboration with Nanofab Facility of CNST, NIST. The second generation gratings are being tested in our laboratory at NIH.