Mask Aligner

我们要求资金购买红外/可见光掩模对准和曝光系统。该基本掩模对准器将服务于本提案中的所有申请人的所有光刻曝光工艺的需要。迫切需要这一工具来维持和提高申请人和使用我们设施的100多名研究人员的研究能力和生产力。掩模对准器将用于广泛领域的应用研究，从微流体紧凑型诊断系统到智能汽车传感器和执行器系统，微机电系统（MEMS）技术以及新型聚合物MEMS和纳米材料嵌入式软光刻的开发。

We ask funding to purchase an infrared/visible mask alignment and exposure system. This basic mask aligner will serve the needs of all lithographic exposure processes for all the applicants in this proposal. This tool is urgently needed to sustain and enhance the research capacity and productivity of the applicants and more than 100 researchers who are using our facilities. The mask aligner will be used in applied research in a wide area ranging from microfluidic compact diagnostic systems to smart automotive sensors and actuator systems, Micro-Electromechanical System (MEMS) technology and also development of novel polymer MEMS, and nano-material embedded soft-lithography.