High resolution customized chirped phase grating mask

创建啁啾光纤光栅的可能性，能够产生显着的色散（在几千皮秒/纳米的范围内），并具有约1 nm的带宽，将开辟一个非常有前途的新的路径色散工程信号处理。为了克服目前FBG技术的局限性，我们提出了推动高啁啾相位掩模（PM），即电子束光刻和等离子体刻蚀，PM技术是最有效和最常见的方法用于制作FBG的制造中涉及的两个微纳米加工技术的边缘。该多学科项目的主要目标是探索制作啁啾率为0.01 nm/cm或更低的PM，从而可以制作在15 cm长光栅上具有独特性能的啁啾FBG，其带宽（~1 nm）和色散（高于5 000 ps/nm）。

The possibility of creating chirped FBGs, capable of producing a significant dispersion (in the range of few thousands picoseconds per nanometer) and having a bandwidth of ~1 nm would open up a tremendously promising new path for dispersion-engineering signal processing. To overcome the limitations of present FBGs technology, we propose to push the edge of two micro-nanofabrication technologies involved in the fabrication of highly chirped Phase Mask (PM), namely electron beam lithography and plasma etching, the PM technique being the most effective and common method for the fabrication of FBGs. The main objective of this multidisciplinary project is to explore the fabrication of PMs with a chirp rate of 0.01 nm/cm or even lower allowing the fabrication of chirped FBGs with unique performances in terms of bandwidth (~1 nm) and dispersion (higher than 5 000 ps/nm) over 15-cm long gratings.