High resolution customized chirped phase grating mask

制造啁啾fbg的可能性，能够产生显著的色散（在每纳米几千皮秒的范围内），并且带宽约为1纳米，这将为色散工程信号处理开辟一条非常有前途的新途径。为了克服目前fbg技术的局限性，我们提出了两种微纳米制造技术的前沿，即电子束光刻和等离子体蚀刻，这两种技术是制造fbg最有效和最常用的方法。这个多学科项目的主要目标是探索啁啾率为0.01 nm/cm或更低的pm的制造，从而使啁啾fbg在15厘米长的光栅上具有独特的带宽（~1 nm）和色散（高于5 000 ps/nm）。

The possibility of creating chirped FBGs, capable of producing a significant dispersion (in the range of few thousands picoseconds per nanometer) and having a bandwidth of ~1 nm would open up a tremendously promising new path for dispersion-engineering signal processing. To overcome the limitations of present FBGs technology, we propose to push the edge of two micro-nanofabrication technologies involved in the fabrication of highly chirped Phase Mask (PM), namely electron beam lithography and plasma etching, the PM technique being the most effective and common method for the fabrication of FBGs. The main objective of this multidisciplinary project is to explore the fabrication of PMs with a chirp rate of 0.01 nm/cm or even lower allowing the fabrication of chirped FBGs with unique performances in terms of bandwidth (~1 nm) and dispersion (higher than 5 000 ps/nm) over 15-cm long gratings.