Novel main group and transition metal precursors for atomic layer and chemical vapor deposition
Novel main group and transition metal precursors for atomic layer and chemical vapor deposition
批准号:
445964-2012
负责人:
Song, Datong
金额:
$10.9万
依托单位:
依托单位国家:
加拿大
项目类别:
Collaborative Research and Development Grants
财政年份:
2015
资助国家:
加拿大
项目状态:
已结题
起止时间:
2015-01-01 至 2016-12-31
中文摘要
由于传统的硅基介电材料已不能满足现代微电子技术的要求,几种性能优越的过渡金属氧化物已被确定为下一代微电子介质材料。本研究计划的一个方面涉及开发用于微电子和半导体制造的过渡金属氧化物薄膜沉积的新前驱体和工艺。本研究的第二个方面旨在开发新的(III/V族和混合)分子前体和工艺,用于生产可用于光电子学的半导体。
英文摘要
As the conventional silica-based dielectric material cannot satisfy the requirement of modern microelectronics, several transition metal oxides with superior properties have been identified as the next generation dielectric materials for microelectronics. One aspect of this research proposal is concerned with the development of new precursors and processes for deposition of thin films of transition metal oxides used in microelectronics and semiconductor fabrication. The second aspect of this research is aimed to develop new (Group III/V and hybrid) molecular precursors and processes for the production of semiconductors that can be used in optoelectronics.
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会议论文
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财政年份:2015
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负责人:Song, Datong
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依托单位:
Novel main group and transition metal precursors for atomic layer and chemical vapor deposition
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批准号:445964-2012
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项目类别:Collaborative Research and Development Grants
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资助金额:$10.9万
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财政年份:2014
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负责人:Song, Datong
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依托单位:
Small molecule activation and sensing
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项目类别:Discovery Grants Program - Individual
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资助金额:$3.93万
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依托单位:
Novel main group and transition metal precursors for atomic layer and chemical vapor deposition
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批准号:445964-2012
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项目类别:Collaborative Research and Development Grants
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资助金额:$10.9万
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负责人:Song, Datong
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依托单位:
d-block and f-block chemistry
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依托单位:
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依托单位:
国内基金
海外基金
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资助金额:--
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依托单位: