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Cluster tool-integrated high-temperature evaporation and chemical vapor deposition chamber

Cluster tool-integrated high-temperature evaporation and chemical vapor deposition chamber
集束工具集成高温蒸发和化学气相沉积室
批准号:
RTI-2017-00187
负责人:
Adachi, Michael
金额:
$10.93万
依托单位:
依托单位国家:
加拿大
项目类别:
Research Tools and Instruments
财政年份:
2016
资助国家:
加拿大
项目状态:
已结题
起止时间:
2016-01-01 至 2017-12-31

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项目成果

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中文摘要
翻译
拟议的设备是一种新的高温沉淀室,专为生长2D材料(类石墨烯材料)而设计,它将与我们位于SFU工程洁净室的现有集群工具集成在一起,用于制造设备。2D材料是晶态单层材料,其中最著名的是石墨烯。最近,其他2D材料,如单层Si(或硅烯)、Ge(或Ge)、P(或P或P)和MoS2已显示出非凡的性能:高的测量载流子迁移率(>200 cm2/vs),理论载流子迁移率是其体相对应的数倍,可由外加垂直电场控制的可调带隙,高比表面积比,用于选择性气体检测的气体吸附的各向异性反应,灵活性,以及顺磁和自旋电子学的特性。 在接下来的5年里,我们(PI和共同申请者)将使用所建议的设备研究通过三种不同的大面积生长方法(蒸发、化学气相沉积(CVD)和等离子体增强CVD(PECVD))生长2D材料。同时,我们将制造用于可调谐红外探测器、气体传感器、生物传感器和储能应用的2D材料器件。设备将在共同申请者的实验室设施中进行测试。这项研究计划的长期目标是将我们实验室开发的2D材料设备商业化。 我们现有的集束式工具配备了两个PECVD室和两个溅射沉积室,但没有一个能够进行2D材料生长。新的腔室将是我们生长2D材料的主要工具,现有的腔室将用于沉积制造器件所用的薄膜(高k介电材料,金属层)。集束式工具系统的主要优势是,在一个腔室中生长的2D材料可以覆盖在其他腔室中沉积的高k电介质和金属层,这在加拿大将是一种独特的能力。通过在不同的腔室之间转移样品,我们可以避免在工艺之间产生杂质污染和不必要的氧化物形成,这是制造高性能器件的一个重要特征。 拟议的设备将在接受培训后向新的和现有的合作者开放,或者受过培训的人员将向合作者提供纳米材料。该系统将支持多个人员的研究计划(2个PDF、9个博士、10个硕士/硕士、6个BASC在所有PI/共同申请者之间)。拖延获得设备将严重限制这些计划,并阻碍新的工业合作,因为如果没有它,我们就无法生长与工业制造最兼容的2D材料:锗和硅烯。拟议的设备将导致新发现的2D材料的材料特性,并使涉及行业合作的设备原型制造方面取得突破,这将对加拿大高科技行业产生直接影响。
英文摘要
The proposed equipment is a new high-temperature deposition chamber designed for growing 2D materials (graphene-like materials), which will be integrated with our existing cluster tool located in the SFU Engineering cleanroom for fabricating devices. 2D materials are crystalline monolayer materials, the most famous of which is graphene. Recently, other 2D materials such as monolayer Si (or silicene), Ge (or germanene), P (or phosphorene), and MoS2 have shown extraordinary properties: high measured carrier mobility (>200 cm2/Vs), theoretical carrier mobility multiple times larger than their bulk counterpart, tuneable bandgap controlled by applied vertical electric field, high surface-volume ratio, anisotropic reaction to gas adsorption for selective gas detection, flexibility, and paramagnetic and spintronic properties. In the next 5 years, we (PI and co-applicants) will investigate the growth of 2D materials by three different large area growth methods (evaporation, chemical vapor deposition (CVD), and plasma-enhanced CVD (PECVD)) using the proposed equipment. Simultaneously, we will fabricate 2D material devices for tuneable infrared detectors, gas sensors, biosensors, and energy storage applications. Devices will be tested in the lab facilities of co-applicants. The long-term objective of this research program is to commercialize 2D material devices developed in our lab. Our existing cluster tool is equipped with two PECVD chambers and two sputtering deposition chambers, but none are capable of 2D material growth. The new chamber will be our primary tool for growing 2D materials and existing chambers will be used to deposit films (high-k dielectric, metal layer) used in making a device. The key advantage of a cluster tool system is that 2D materials grown in one chamber can be covered with a high-k dielectric and metal layer deposited in other chambers, which would be a unique capability in Canada. Transferring samples between chambers allows us to avoid impurity contamination and undesirable oxide formation between processes, an important feature for making high-performance devices. The proposed equipment will be open to new and current collaborators after receiving training, or trained personnel will provide nanomaterials to collaborators. This system will enable research programs of multiple personnel (2 PDF, 9 PhD, 10 MASc/MSc, 6 BASc between all PI/co-applicants). Delay on acquiring the equipment will severely limit these programs and hinder new industrial collaborations because without it, we cannot grow the 2D materials which are most compatible with industrial manufacturing: germanene and silicene. The proposed equipment will lead to newly discovered material properties of 2D materials, and enable breakthroughs in device prototype fabrication involving industrial collaborations, which will have a direct impact on the Canadian high tech sector.
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