ROW Research Initiation: Space Charge Phenomena in High Resistivity Semiconductors
ROW Research Initiation: Space Charge Phenomena in High Resistivity Semiconductors
批准号:
8809298
负责人:
Nancy Haegel
金额:
$6.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-07-15 至 1990-12-31
中文摘要
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英文摘要
The objective of this investigation is to study the relaxation behavior of the space charge near injecting electrical contacts on high resistivity semiconductors. The transport of charge carriers in the regime dominated by dielectric relaxation of space charge is not well understood. The materials being investigated are high purity silicon and germanium at low temperatures and gallium arsenide at room temperature, where they are semi-insulating. The transition from low resistivity to high resistivity will be studied using current-voltage and capacitance-voltage techniques to observe the transition in the material from lifetime-dominated to relaxation=dominated conduction. High-resistivity semiconductors become more important as electronic circuits become more highly integrated (increasing the density of devices on a single chip or conversely decreasing the distance between neighboring electronic elements), which increases the necessity to insulate neighboring electronic elements from each other. Use of insulating or semi-insulating materials to store charge also increases the need to understand the dielectric relaxation effects in these materials. The transport physics of these materials is poorly understood, partially ignored, and controversial at the present time. This research aims to provide accurate and realistic data on the transport in semi-insulating materials.
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ARI-MA Collaborative Research: - High Z Materials for Nuclear Detection: Synergy of Growth, Characterization and Device Physics for Room Temperature Devices
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批准号:0833007
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项目类别:Interagency Agreement
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依托单位:
IMR: Development of an Imaging Transport Instrument for Materials Research and Education
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财政年份:2005
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POWRE: Imaging Near-Contact Transport in High Resistivity Semiconductors
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项目类别:Standard Grant
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资助金额:$6.65万
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财政年份:1998
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负责人:Nancy Haegel
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依托单位:
Presidential Young Investigator Award
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批准号:9496119
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项目类别:Continuing Grant
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资助金额:$3.82万
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财政年份:1993
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负责人:Nancy Haegel
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依托单位:
Development of a Scanning Electron Microscope Based Microcharacterization Facility
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批准号:9112979
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项目类别:Standard Grant
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资助金额:$10.4万
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财政年份:1991
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负责人:Nancy Haegel
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依托单位:
Engineering Creativity Award for Mathew Wilson
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批准号:9021051
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项目类别:Continuing Grant
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资助金额:$9.0万
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财政年份:1990
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负责人:Nancy Haegel
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依托单位:
Presidential Young Investigator Award
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批准号:8957215
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项目类别:Continuing Grant
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资助金额:$31.52万
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财政年份:1989
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负责人:Nancy Haegel
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依托单位:
Research Experience For Undergraduates (REU): Preparation and Properties of Electronic Materials
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财政年份:1989
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依托单位:
Engineering Creativity Award: Optoelectronic Multilayer Characterization
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批准号:8811578
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项目类别:Standard Grant
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资助金额:$5.39万
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财政年份:1988
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负责人:Nancy Haegel
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依托单位:
Transient Electrical and Optical Behavior of High Resistivity Semiconductors (Materials Research)
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批准号:8707372
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项目类别:Standard Grant
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资助金额:$1.2万
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财政年份:1987
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负责人:Nancy Haegel
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依托单位:
国内基金
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