High-Force Microactuator Using Nickel-Titanium Shape- Memory Alloy

TiNi合金公司计划开发使用真空沉积形状记忆合金的高力微致动器。目前正在实验室研究的微机械设备(几年后将达到市场成熟)以及至少一种目前正在商业化生产的设备(硅芯片上的气相色谱仪)需要改进的微执行器。与静电装置相比，形状记忆合金微执行器的潜在优势是力和位移增加了几个数量级。TiNi形状记忆合金能承受3-5%的大应变，并产生大于100兆帕的大应力。TiNi形状记忆合金薄膜将通过微加工与硅组件结合，我们的实验室已经证明了这种薄膜具有很强的形状恢复能力。形状记忆合金与硅的结合技术将为微机械应用提供一种新的工程材料。要解决的研究目标包括：改进真空溅射技术以提高薄膜的产量和质量；TiNi薄膜的物理表征；通过掩模和选择性蚀刻进行平面制造；以及开发阀门和泵执行器等功能部件。

TiNi Alloy Company proposes to develop high-force micro-actuators using vacuum deposited shape-memory alloys. Improved micro-actuators are needed for micro- mechanical devices now being researched in laboratories (and which will reach market maturity in a few years) and for at least one device now in commercial production (a gas chromatograph on a silicon chip). The potential advantage of shape-memory alloy microactuators over electrostatic devices is several orders of magnitude increase in force and displacement. TiNi shape-memory alloy tolerates large strain, 3-5 percent, and produces large stress, greater than 100 mpa. Thin films of TiNi shape-memory alloy, which have been demonstrated in our laboratory to exhibit a forceful shape recovery, will be incorporated with silicon components by micro-fabrication. The combined technologies of shape-memory alloy and silicon will result in a new engineering material for micro-mechanical applications. The research objectives to be addressed include: improved vacuum sputtering techniques to improve yield and quality of film; physical characterization of TiNi film; planar fabrication by masking and selective etching; and development of functional components such as valve and pump actuators.