High-Force Microactuator Using Nickel-Titanium Shape- Memory Alloy

使用镍钛形状记忆合金的高力微执行器

• 批准号: 8961087
• 负责人: Alfred Johnson
• 金额: $ 5万
• 依托单位: TiNi Alloy Company
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-01-01 至 1990-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8961087&HistoricalAwards=false
• 关键词: Force; Microactuator; Using; Nickel; Titanium

TiNi Alloy Company proposes to develop high-force micro-actuators using vacuum deposited shape-memory alloys. Improved micro-actuators are needed for micro- mechanical devices now being researched in laboratories (and which will reach market maturity in a few years) and for at least one device now in commercial production (a gas chromatograph on a silicon chip). The potential advantage of shape-memory alloy microactuators over electrostatic devices is several orders of magnitude increase in force and displacement. TiNi shape-memory alloy tolerates large strain, 3-5 percent, and produces large stress, greater than 100 mpa. Thin films of TiNi shape-memory alloy, which have been demonstrated in our laboratory to exhibit a forceful shape recovery, will be incorporated with silicon components by micro-fabrication. The combined technologies of shape-memory alloy and silicon will result in a new engineering material for micro-mechanical applications. The research objectives to be addressed include: improved vacuum sputtering techniques to improve yield and quality of film; physical characterization of TiNi film; planar fabrication by masking and selective etching; and development of functional components such as valve and pump actuators.

天尼合金公司提出利用真空沉积形状记忆合金开发高强度微致动器。目前正在实验室研究的微机械设备（将在几年内达到市场成熟）和至少一种商业化生产的设备（硅芯片上的气相色谱仪）都需要改进的微致动器。与静电器件相比，形状记忆合金微致动器的潜在优势是力和位移增加了几个数量级。TiNi形状记忆合金可承受大应变3- 5%，并产生大于100mpa的大应力。TiNi形状记忆合金薄膜，在我们的实验室中已经被证明具有强大的形状恢复能力，将通过微加工与硅元件结合。形状记忆合金与硅相结合的技术将为微机械应用提供一种新的工程材料。研究目标包括：改进真空溅射技术，提高薄膜的产量和质量；TiNi薄膜的物理特性；掩膜和选择性蚀刻的平面加工；以及阀门、泵执行器等功能部件的开发。