REU: Modeling of Remote Plasma Assisted Materials Processing: Electron Transport and Selective Chemistry

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Remote Plasma Assisted Materials Processing (RPAMP) is a method whereby etchings and depositions may be performed with the substrate located out of the plasma zone. This enables processing to be performed without significant damage by ion bombardment and with highly selective chemical reaction pathways. Selectivity in RPAMP results from the ability to initiate a selected subset of reactions compared to conventional plasma processing. In this project we propose to continue studies of the electron kinetics and chemistry of processing plasmas with emphasis on electron transport and selective chemistries in remote plasma devices. A new algorithm called Combination Kinetics is introduced for simultaneously obtaining electron energy distributions and excited state densities in multiple dimensions.