Simulation of 3-dimensional Transport and Transients in Plasma Processing Reactors Using Moderate Parallelism

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AbstractKushner, Mark J.CTS-9974962U of ILL Urbana-Champaign In this project, three-dimensional plasma equipment models (PEMs) are developed to investigate chemical, physical, and engineering scaling issues in plasma-processing reactors of industrial interest. These models build upon an integrated hybrid simulation hierarchy in which PEMs are linked with plasma-surface interaction models. New algorithms for 3-d electron and ion transport, sheath structure, and plasma-surface interactions are developed for investigation of transient plasma processes. Moderately parallel (2-10 processors) computers are employed so that transient or real-time linking of phenomena having disparate timescales can be addressed. Reactors with rotating magnetic fields, such as magnetically enhanced reactive ion etching (MERIE) and ionized metal physical vapor deposition (IMPVD) reactors, wave-plasma phenomena in helicon reactors, and transients (startup, shutdown, recipe changes) in "conventional" reactors like inductively coupled plasma (ICP) reactors are investigated. The objectives are to assess the impact of 3-d plasma transport on the uniformity and quality of the etch or deposition and to generate scaling laws to transfer these assessments to other systems