Atmospheric Pressure, Plasma Chemistry, Plasma Dynamics, Particle Effects and Gas Dynamics in Plasma Remediation of Toxic Gases
Atmospheric Pressure, Plasma Chemistry, Plasma Dynamics, Particle Effects and Gas Dynamics in Plasma Remediation of Toxic Gases
批准号:
9412565
负责人:
Mark Kushner
金额:
$22.76万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-11-01 至 1998-10-31
中文摘要
日益提高的环境意识和法规促使人们研究新的方法来修复大气压气流中的毒素。 在第一届国际EPRI/NSF先进氧化技术研讨会上,等离子体修复被认为是一种有前途的处理污染气流和空气的技术。 来自移动的排放源的有毒气体流的等离子体修复(例如卡车柴油发动机的氮氧化物排放)、遥远或零星排放源(例如柴油应急发电机)或小型装置(例如,从干洗店释放的挥发性有机溶剂,VOC)需要便宜的、低电压的、紧凑的,和可靠的系统,其有效地和选择性地将有毒气体转化为良性或更可处理的产物。 介质阻挡放电是这些系统的候选者。 在这个项目中,将进行污染的大气压气流的等离子体修复的多维计算机建模。 这项工作的目标是:a)调查的流体力学和等离子体化学的等离子体整治系统使用介质阻挡放电; B)开发计算机模型的有毒气体的等离子体整治能够被用来设计实际的可制造的系统;和c)与正在进行的实验在洛斯阿拉莫斯国家实验室和南加州大学进行合作,以验证模型和实施建议。 测试系统将从柴油机排气中进行NOx修复。 VOCs的治理将在稍后进行研究。
英文摘要
Increasing environmental awareness and regulation have motivated research into new methods to remediate toxins from atmospheric pressure gas streams. At the First International EPRI/NSF Symposium on Advanced Oxidation Techniques, plasma remediation was identified as a promising technology treating contaminated gas streams and air. Plasma remediation of toxic gas streams from mobile emitting sources (for example, Nox emission from diesel truck engines), remote or sporadically emitting sources (for example, diesel emergency generators) or small installations (for example, volatile organic solvents, VOCs, released from dry cleaners) require inexpensive, low-voltage, compact, and reliable systems which efficiently and selectively convert the toxic gas to benign or more treatable products. Dielectric barrier discharges are candidates for these systems. In this project, multidimensional computer modeling of the plasma remediation of contaminated atmospheric pressure gas streams will be performed. The goals of this work are: a) Investigate the hydrodynamics and plasma chemistry of plasma remediation systems using dielectric barrier discharges; b) develop computer models of plasma remediation of toxic gases capable of being used to design practical manufacturable systems; and c) collaborate with experiments being performed at Los Alamos National Laboratory and the University of Southern California to validate the models and implement recommendations. The test system will be Nox remediation from diesel exhaust. Remediation of VOCs will be investigated later.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
GCR: Collaborative Research: Plasma-Biofilm Interactions at the Intersection of Physics, Chemistry, Biology and Engineering
-
批准号:2020010
-
项目类别:Continuing Grant
-
资助金额:$74.0万
-
财政年份:2020
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: GOALI - Nonlinear Coupling in Pulsed Electronegative Plasmas: Multiple-sources, Multiple-frequencies, Multiple-time scales
-
批准号:2009219
-
项目类别:Standard Grant
-
资助金额:$26.7万
-
财政年份:2020
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: ECO-CBET: Methane Conversion by Merging Atmospheric Plasma with Transition-Metal Catalysis
-
批准号:2032604
-
项目类别:Continuing Grant
-
资助金额:$50.0万
-
财政年份:2020
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: Understanding Plasma-Liquid Interactions Through Controlled Plasma-Microdroplet Experiments and Modeling
-
批准号:1902878
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2019
-
负责人:Mark Kushner
-
依托单位:
A Workshop on Science Challenges in Low Temperature Plasma Science and Engineering: Enabling a Future Based on Electricity through Non-Equilibrium Plasma Chemistry
-
批准号:1613074
-
项目类别:Standard Grant
-
资助金额:$3.58万
-
财政年份:2016
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: GOALI - Non-Equilibrium Processes, Stability, Design and Control of Pulsed Plasmas for Materials Processing
-
批准号:1500126
-
项目类别:Standard Grant
-
资助金额:$1.5万
-
财政年份:2015
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: CDI-Type II: Cyber-Enabled Studies of Complexity in Nanodusty Plasmas
-
批准号:1124724
-
项目类别:Standard Grant
-
资助金额:$59.08万
-
财政年份:2011
-
负责人:Mark Kushner
-
依托单位:
International Experiences in Low Temperature Plasmas: Student Travel Support to Attend the 2010 Gaseous Electronics Conference, October 4-8, 2010 in Paris, France
-
批准号:1038603
-
项目类别:Standard Grant
-
资助金额:$1.5万
-
财政年份:2010
-
负责人:Mark Kushner
-
依托单位:
Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
-
批准号:0520368
-
项目类别:Continuing Grant
-
资助金额:$10.39万
-
财政年份:2005
-
负责人:Mark Kushner
-
依托单位:
Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
-
批准号:0315353
-
项目类别:Continuing Grant
-
资助金额:$32.4万
-
财政年份:2003
-
负责人:Mark Kushner
-
依托单位:
Gordon Research Conference on Plasma Processing Science: Support for Graduate and Post-Doctoral Students
-
批准号:0215382
-
项目类别:Standard Grant
-
资助金额:$0.9万
-
财政年份:2002
-
负责人:Mark Kushner
-
依托单位:
Simulation of 3-dimensional Transport and Transients in Plasma Processing Reactors Using Moderate Parallelism
-
批准号:9974962
-
项目类别:Continuing Grant
-
资助金额:$31.5万
-
财政年份:1999
-
负责人:Mark Kushner
-
依托单位:
Engineering Research Equipment: Moderately Parallel ComputerEquipment for Design of Plasma Equipment for Microelectronics Manufacturing and Environmental Cleanup
-
批准号:9500023
-
项目类别:Standard Grant
-
资助金额:$3.3万
-
财政年份:1996
-
负责人:Mark Kushner
-
依托单位:
Electrode Topography in Plasma Processing Reactors: Uniformity, Dust Particle Trapping and Differential Wafer Charging
-
批准号:9404133
-
项目类别:Continuing Grant
-
资助金额:$26.12万
-
财政年份:1994
-
负责人:Mark Kushner
-
依托单位:
REU: Modeling of Remote Plasma Assisted Materials Processing: Electron Transport and Selective Chemistry
-
批准号:9109326
-
项目类别:Continuing Grant
-
资助金额:$23.29万
-
财政年份:1991
-
负责人:Mark Kushner
-
依托单位:
Particles in rf Plasma Processing Discharges: Generation, Transport and Plasma Dynamics
-
批准号:9113215
-
项目类别:Continuing Grant
-
资助金额:$22.75万
-
财政年份:1991
-
负责人:Mark Kushner
-
依托单位:
Particles in Plasmas: Electron Transport Coefficients and Discharge Stability
-
批准号:8803170
-
项目类别:Continuing Grant
-
资助金额:$19.95万
-
财政年份:1988
-
负责人:Mark Kushner
-
依托单位:
Self-Consistent Monte-Carlo Particle Simulations for Collisional Low Temperature Plasmas: Applications to Magnetron Deposition/Etching Systems
-
批准号:8815781
-
项目类别:Continuing Grant
-
资助金额:$16.82万
-
财政年份:1988
-
负责人:Mark Kushner
-
依托单位:
REG: Computer Equipment for the Computational Gaseous Electronics Group at the University of Illinois
-
批准号:8704824
-
项目类别:Standard Grant
-
资助金额:$1.0万
-
财政年份:1987
-
负责人:Mark Kushner
-
依托单位:
海外基金