Particles in rf Plasma Processing Discharges: Generation, Transport and Plasma Dynamics

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Glow discharge radio frequency (rf) discharges, as used for plasma materials processing, are inevitably contamined by particulate matter. These particles, or "dust", result from gas phase nucleation, polymerization or sputtering of surfaces. At one extreme, the yield of microelectronic devices and thin films fabricated in contamined plasmas are known to be poor. Particles, however, are also intentionally produced in discharges for starting materials to fabricate nonphase solids. The methods of generation, transport and the effects of particles on plasma dynamics are largely unknown. We propose to computationally investigate the conditions with lead to formation of particles, the effects of particles on the characteristics of rf discharges, and how particles from the plasma contaminate surfaces. In doing so, we will also investigate methods whereby the formation of particles can be intentionally enhanced as in the synthesis of nanocrystals. The single greatest cause of reduced yields of microelectronic devices prepared by plasma processing is particle contamination. Therefore, understanding the method of generation, transport and effects on plasma parameters of particles will have an important impact on microelectronics fabrication and the specialty powders industries.