Particles in rf Plasma Processing Discharges: Generation, Transport and Plasma Dynamics

用于等离子体材料处理的辉光放电射频（rf）放电不可避免地受到颗粒物质的污染。这些颗粒或“灰尘”是由气相成核、聚合或表面溅射产生的。在一种极端情况下，在受污染的等离子体中制造的微电子器件和薄膜的产量很低。然而，颗粒也有意地在排放物中产生，用于起始材料以制造非相固体。粒子的产生、输运和对等离子体动力学的影响在很大程度上是未知的。我们建议通过计算研究导致粒子形成的条件，粒子对射频放电特性的影响，以及等离子体中的粒子如何污染表面。在此过程中，我们还将研究在纳米晶体合成中有意增强颗粒形成的方法。等离子体工艺制备的微电子器件产量下降的最大原因是粒子污染。因此，了解粒子的产生、输运及其对等离子体参数的影响将对微电子制造和特种粉末工业产生重要影响。

Glow discharge radio frequency (rf) discharges, as used for plasma materials processing, are inevitably contamined by particulate matter. These particles, or "dust", result from gas phase nucleation, polymerization or sputtering of surfaces. At one extreme, the yield of microelectronic devices and thin films fabricated in contamined plasmas are known to be poor. Particles, however, are also intentionally produced in discharges for starting materials to fabricate nonphase solids. The methods of generation, transport and the effects of particles on plasma dynamics are largely unknown. We propose to computationally investigate the conditions with lead to formation of particles, the effects of particles on the characteristics of rf discharges, and how particles from the plasma contaminate surfaces. In doing so, we will also investigate methods whereby the formation of particles can be intentionally enhanced as in the synthesis of nanocrystals. The single greatest cause of reduced yields of microelectronic devices prepared by plasma processing is particle contamination. Therefore, understanding the method of generation, transport and effects on plasma parameters of particles will have an important impact on microelectronics fabrication and the specialty powders industries.