Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
批准号:
0315353
负责人:
Mark Kushner
金额:
$32.4万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-07-01 至 2005-04-30
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Project SummaryAtmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma Surface InteractionsThis is a computational research program that investigates fundamentals of atmospheric-pressure plasma (APP) transport and plasma-surface interactions in the context of APP processing of polymers. The goals of this program are an integrated, multi-scale modeling hierarchy, spanning scales of nanometers to centimeters, and its use to determine the limiting plasma transport processes and upside potential of APP processing of high-value materials. These goals are met by developing a comprehensive, 3-dimensional plasma-dynamics model for atmospheric-pressure corona and glow discharges that is capable of investigating complex plasma chemistries; developing 3-d plasma-surface interaction algorithms capable of addressing the nanoscale spatial structures typically found on polymers; adapting feature-profile models (originally developed for semiconductor processing) to address plasma-initiated chemistry on polymer surfaces; and integrating these modules into a centimeter-to-nanometer hierarchy.The use of plasmas to produce desired surface properties of a polymer, such as hydrophobicity or hydrophilicity, is a topic both of current scientific investigation and of commercial interest. There are two pathways to achieve this functionalization: deposition and modification. In plasma deposition, polymeric surfaces with specific characteristics are obtained by depositing materials from a plasma. These processes are usually performed at low pressures in systems not unlike those used for microelectronics fabrication. As a consequence, such processing is usually limited to high-value-added materials, such as for biologically compatible coatings. In plasma modification, a conventionally manufactured inexpensive polymer is treated with a plasma to change its surface properties. These processes are typically conducted at atmospheric pressure using corona discharge devices in a "web" arrangement. Unlike low-pressure plasma deposition, APP (atmospheric pressure plasma) processing of polymers is usually a low-value-added process. Polymers and plastics such as polypropylene and polyethylene are processed to improve their adhesion and wettability. In spite of the commercial use of APPs for treating polymers, there are few first order, fundamentals-based models describing the plasma-surface interactions that modify polymer surfaces. As a consequence, the development and optimization of APPs for polymer processing has been, for all practical purposes, an empirical undertakingBroader Impacts The economic and societal benefits of being able to adapt inexpensive and high-volume APP methods for modifying polymers to produce high-value films is staggering. For example, biocompatible artificial skin for treatment of burn patients could be produced for $1/m2 as opposed to $1,000's to $10,000's per m2 which is typical of newly FDA-approved products. The current knowledge base is inadequate to make these advances and improving that knowledge base will help determine the practicality of achieving these goals. The computational techniques and improvements in the knowledge base produced in this project are applicable to a variety of APP applications, including lighting, toxic gas remediation, sterilization of surfaces, bioremediation, and microdischarges..
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
GCR: Collaborative Research: Plasma-Biofilm Interactions at the Intersection of Physics, Chemistry, Biology and Engineering
-
批准号:2020010
-
项目类别:Continuing Grant
-
资助金额:$74.0万
-
财政年份:2020
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: GOALI - Nonlinear Coupling in Pulsed Electronegative Plasmas: Multiple-sources, Multiple-frequencies, Multiple-time scales
-
批准号:2009219
-
项目类别:Standard Grant
-
资助金额:$26.7万
-
财政年份:2020
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: ECO-CBET: Methane Conversion by Merging Atmospheric Plasma with Transition-Metal Catalysis
-
批准号:2032604
-
项目类别:Continuing Grant
-
资助金额:$50.0万
-
财政年份:2020
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: Understanding Plasma-Liquid Interactions Through Controlled Plasma-Microdroplet Experiments and Modeling
-
批准号:1902878
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2019
-
负责人:Mark Kushner
-
依托单位:
A Workshop on Science Challenges in Low Temperature Plasma Science and Engineering: Enabling a Future Based on Electricity through Non-Equilibrium Plasma Chemistry
-
批准号:1613074
-
项目类别:Standard Grant
-
资助金额:$3.58万
-
财政年份:2016
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: GOALI - Non-Equilibrium Processes, Stability, Design and Control of Pulsed Plasmas for Materials Processing
-
批准号:1500126
-
项目类别:Standard Grant
-
资助金额:$1.5万
-
财政年份:2015
-
负责人:Mark Kushner
-
依托单位:
Collaborative Research: CDI-Type II: Cyber-Enabled Studies of Complexity in Nanodusty Plasmas
-
批准号:1124724
-
项目类别:Standard Grant
-
资助金额:$59.08万
-
财政年份:2011
-
负责人:Mark Kushner
-
依托单位:
International Experiences in Low Temperature Plasmas: Student Travel Support to Attend the 2010 Gaseous Electronics Conference, October 4-8, 2010 in Paris, France
-
批准号:1038603
-
项目类别:Standard Grant
-
资助金额:$1.5万
-
财政年份:2010
-
负责人:Mark Kushner
-
依托单位:
Atmospheric Pressure Plasma Processing of Polymers: Plasma Dynamics and Nanoscale Plasma-Surface Interactions
-
批准号:0520368
-
项目类别:Continuing Grant
-
资助金额:$10.39万
-
财政年份:2005
-
负责人:Mark Kushner
-
依托单位:
Gordon Research Conference on Plasma Processing Science: Support for Graduate and Post-Doctoral Students
-
批准号:0215382
-
项目类别:Standard Grant
-
资助金额:$0.9万
-
财政年份:2002
-
负责人:Mark Kushner
-
依托单位:
Simulation of 3-dimensional Transport and Transients in Plasma Processing Reactors Using Moderate Parallelism
-
批准号:9974962
-
项目类别:Continuing Grant
-
资助金额:$31.5万
-
财政年份:1999
-
负责人:Mark Kushner
-
依托单位:
Engineering Research Equipment: Moderately Parallel ComputerEquipment for Design of Plasma Equipment for Microelectronics Manufacturing and Environmental Cleanup
-
批准号:9500023
-
项目类别:Standard Grant
-
资助金额:$3.3万
-
财政年份:1996
-
负责人:Mark Kushner
-
依托单位:
Electrode Topography in Plasma Processing Reactors: Uniformity, Dust Particle Trapping and Differential Wafer Charging
-
批准号:9404133
-
项目类别:Continuing Grant
-
资助金额:$26.12万
-
财政年份:1994
-
负责人:Mark Kushner
-
依托单位:
Atmospheric Pressure, Plasma Chemistry, Plasma Dynamics, Particle Effects and Gas Dynamics in Plasma Remediation of Toxic Gases
-
批准号:9412565
-
项目类别:Standard Grant
-
资助金额:$22.76万
-
财政年份:1994
-
负责人:Mark Kushner
-
依托单位:
REU: Modeling of Remote Plasma Assisted Materials Processing: Electron Transport and Selective Chemistry
-
批准号:9109326
-
项目类别:Continuing Grant
-
资助金额:$23.29万
-
财政年份:1991
-
负责人:Mark Kushner
-
依托单位:
Particles in rf Plasma Processing Discharges: Generation, Transport and Plasma Dynamics
-
批准号:9113215
-
项目类别:Continuing Grant
-
资助金额:$22.75万
-
财政年份:1991
-
负责人:Mark Kushner
-
依托单位:
Particles in Plasmas: Electron Transport Coefficients and Discharge Stability
-
批准号:8803170
-
项目类别:Continuing Grant
-
资助金额:$19.95万
-
财政年份:1988
-
负责人:Mark Kushner
-
依托单位:
Self-Consistent Monte-Carlo Particle Simulations for Collisional Low Temperature Plasmas: Applications to Magnetron Deposition/Etching Systems
-
批准号:8815781
-
项目类别:Continuing Grant
-
资助金额:$16.82万
-
财政年份:1988
-
负责人:Mark Kushner
-
依托单位:
REG: Computer Equipment for the Computational Gaseous Electronics Group at the University of Illinois
-
批准号:8704824
-
项目类别:Standard Grant
-
资助金额:$1.0万
-
财政年份:1987
-
负责人:Mark Kushner
-
依托单位:
海外基金