Engineering Research Equipment: Organometallic Vapor-Phase Epitaxy Reactor with Ultrahigh-Vacuum Interface and Sample Manipulator

有机金属气相外延研究设备 （OMVPE）的几种半导体，包括砷化镓和 碲化镉，在诸如砷化镓或 硅，正在升级。 升级包括一个OMPVE 具有超高真空（UHV）接口的反应堆，以及新的 机械手为现有的特高压室。 这将使 金属有机化合物在有机玻璃上的表面反应研究 在OMVPE工艺中实际发现的晶体表面。 的 改进的仪器将用于研究表面化学 II-VI族化合物、半导体异质外延和OMVPE 反应动力学。

Equipment for the study of organometallic vapor-phase epitaxy (OMVPE) of several semiconductors, including gallium arsenide and cadmium telluride, on such substrates as gallium arsenide or silicon, is being upgraded. The upgrade consists of an OMPVE reactor with an ultrahigh-vacuum (UHV) interface, and a new manipulator for the existing UHV chamber. This will enable the study of surface reactions of organometallic compounds on the crystal surfaces actually found in the OMVPE process. The improved apparatus will be used to study surface chemistry of II-VI compounds, heteroepitaxy of semiconductors, and OMVPE reaction kinetics.//