Micromirror Arrays for Imaging Sensors
Micromirror Arrays for Imaging Sensors
批准号:
0413012
负责人:
Robert Hicks
金额:
$34.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-10-01 至 2008-09-30
中文摘要
点击翻译按钮获取中文摘要
英文摘要
For decades, the lens-CCD chip paradigm has dominated the design of imaging sensors. Design goals of these systems are to maximize resolution and to maximize the field of view. This work proposes a new design paradigm for a sensor that employs state-of-the art optical micro-electro-mechanical systems, with the goal of ultimately producing ultra-high resolution images. This will be made possible by an application of the theory of vector fields and distributions to optical design, and the effort will entail collaboration between a mathematician and an electrical engineer. A major component of this work will involve the integration of research and education. This work will enable students and researchers to explore the multi-discipline area of optical microsystems through the development of courses, labs, and research experiences, developing a qualified next-generation engineering force for US leadership in the emerging optical microsystem field.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Distributions for Optical Design
-
批准号:0908299
-
项目类别:Standard Grant
-
资助金额:$26.4万
-
财政年份:2009
-
负责人:Robert Hicks
-
依托单位:
Digital Lenses
-
批准号:0211283
-
项目类别:Standard Grant
-
资助金额:$10.0万
-
财政年份:2003
-
负责人:Robert Hicks
-
依托单位:
Nanoscience of Metalorganic Chemical Vapor Deposition of Compound Semiconductors
-
批准号:0004484
-
项目类别:Standard Grant
-
资助金额:$35.0万
-
财政年份:2001
-
负责人:Robert Hicks
-
依托单位:
Reaction Chemistry of Plasma Enhanced Chemical Vapor Deposition at Atmospheric Pressure
-
批准号:9821062
-
项目类别:Continuing Grant
-
资助金额:$34.9万
-
财政年份:1999
-
负责人:Robert Hicks
-
依托单位:
Chemistry of the Metalorganic Chemical Vapor Deposition of InGaP/GaAs Heterojunction Bipolar Transistors
-
批准号:9804719
-
项目类别:Continuing Grant
-
资助金额:$22.3万
-
财政年份:1998
-
负责人:Robert Hicks
-
依托单位:
Surface Chemistry and Kinetics of the Metalorganic Chemical Vapor Deposition of II-VI Materials
-
批准号:9531785
-
项目类别:Continuing Grant
-
资助金额:$29.0万
-
财政年份:1996
-
负责人:Robert Hicks
-
依托单位:
Site-Specific P-Type Doping of Indium-Gallium-Arsenide with Carbon by Metalorganic Chemical Vapor Deposition
-
批准号:9422602
-
项目类别:Standard Grant
-
资助金额:$14.0万
-
财政年份:1995
-
负责人:Robert Hicks
-
依托单位:
Engineering Research Equipment: Scanning Tunneling Microscope for Studying Semiconductor Surface Reactions
-
批准号:9500387
-
项目类别:Standard Grant
-
资助金额:$8.29万
-
财政年份:1995
-
负责人:Robert Hicks
-
依托单位:
Engineering Research Equipment: Organometallic Vapor-Phase Epitaxy Reactor with Ultrahigh-Vacuum Interface and Sample Manipulator
-
批准号:9310583
-
项目类别:Standard Grant
-
资助金额:$4.91万
-
财政年份:1993
-
负责人:Robert Hicks
-
依托单位:
The Molecular Kinetics of the Organometallic Vapor-Phase Epitaxy of II-VI Materials
-
批准号:9121811
-
项目类别:Continuing Grant
-
资助金额:$23.9万
-
财政年份:1992
-
负责人:Robert Hicks
-
依托单位:
Research Initiation: Effect of Metal-Support Interactions on Heptane Dehydrocylization over Platinum on Barium- Potassium Zeolite L
-
批准号:8810326
-
项目类别:Standard Grant
-
资助金额:$7.0万
-
财政年份:1988
-
负责人:Robert Hicks
-
依托单位:
海外基金