Remote Dissociation of Halogens and Interhalogens onto Low Work Function Surfaces

这项研究项目在分析和表面化学计划的支持下，探索了卤素分子与特征良好的Al(111)表面的相互作用。它特别涉及与卤素，特别是卤素间分子发生的抽象解离吸附。加州大学圣地亚哥分校的Kummel教授和他的学生将结合分子束散射和扫描隧道显微镜方法来探索这些分子相互作用的详细动力学，以期了解伴随解离吸附的长程电荷转移过程。定向光束方法也将被用来探测卤间化合物的摆态与低功函数铝表面的相互作用。了解氯等简单的高电子亲和力分子与铝等低功函数金属相互作用时的解离吸附是本研究项目的重点。使用散射和表面显微方法探索这种相互作用的动力学将提供关于这些反应的机理的信息，这些反应在电子材料的加工和腐蚀过程中是重要的。

This research project, supported by the Analytical and Surface Chemistry Program, explores the interaction of halogen molecules with the well characterized Al(111) surface. It is particularly concerned with the abstractive dissociative adsorption which can occur with halogens, especially interhalogen molecules. Professor Kummel and his students at the University of California at San Diego will combine molecular beam scattering and scanning tunneling microscopy methods to probe the detailed dynamics of the interaction of these molecules, with a view to understanding the long range charge transfer process which accompanies dissociative adsorption. Oriented beam methods will also be used to probe the interaction of pendular states of the interhalogens with the low work function aluminum surface. An understanding of the dissociative adsorption of simple, high electron affinity molecules such as chlorine when interacting with low work function metals such as aluminum is the focus of this research project. Probing the dynamics of this interaction using scattering and surface microscopic methods will provide information about the mechanisms of these reactions, which are important in the processing of electronic materials, and in corrosion processes.