Remote Dissociation of Halogens and Interhalogens onto Low Work Function Surfaces

该研究项目由分析和表面化学项目支持，探索卤素分子与表征良好的Al（111）表面的相互作用。它特别关注卤素，特别是卤素间分子可能发生的抽象解离吸附。加州大学圣地亚哥分校的Kummel教授和他的学生将结合分子束散射和扫描隧道显微镜方法来探测这些分子相互作用的详细动力学，以期了解伴随解离吸附的远距离电荷转移过程。取向束方法也将用于探测卤素间素的摆态与低功函数铝表面的相互作用。了解简单、高电子亲和分子（如氯）与低功功能金属（如铝）相互作用时的解离吸附是本研究项目的重点。利用散射和表面微观方法探测这种相互作用的动力学将提供有关这些反应机制的信息，这在电子材料的加工和腐蚀过程中是重要的。

This research project, supported by the Analytical and Surface Chemistry Program, explores the interaction of halogen molecules with the well characterized Al(111) surface. It is particularly concerned with the abstractive dissociative adsorption which can occur with halogens, especially interhalogen molecules. Professor Kummel and his students at the University of California at San Diego will combine molecular beam scattering and scanning tunneling microscopy methods to probe the detailed dynamics of the interaction of these molecules, with a view to understanding the long range charge transfer process which accompanies dissociative adsorption. Oriented beam methods will also be used to probe the interaction of pendular states of the interhalogens with the low work function aluminum surface. An understanding of the dissociative adsorption of simple, high electron affinity molecules such as chlorine when interacting with low work function metals such as aluminum is the focus of this research project. Probing the dynamics of this interaction using scattering and surface microscopic methods will provide information about the mechanisms of these reactions, which are important in the processing of electronic materials, and in corrosion processes.