Remote Dissociation of Halogens and Interhalogens onto Low Work Function Surfaces

该研究项目由分析和表面化学计划支持，探索卤素分子与表征良好的Al（111）表面的相互作用。 它特别关注的是抽象的解离吸附，可以发生与卤素，特别是卤间分子。 教授 库梅尔和他在圣地亚哥的加州大学的学生们 将联合收割机分子束散射和扫描隧道 显微镜方法来探测这些分子的相互作用的详细动力学，以期了解伴随解离吸附的长程电荷转移过程。 定向束方法也将被用来探测与低功函数铝表面的卤素间的摆动状态的相互作用。 本研究项目的重点是了解简单的高电子亲和性分子（如氯）与低功函数金属（如铝）相互作用时的解离吸附。 使用散射和表面显微镜方法探测这种相互作用的动力学将提供有关这些反应机制的信息，这些反应在电子材料加工和腐蚀过程中非常重要。

This research project, supported by the Analytical and Surface Chemistry Program, explores the interaction of halogen molecules with the well characterized Al(111) surface. It is particularly concerned with the abstractive dissociative adsorption which can occur with halogens, especially interhalogen molecules. Professor Kummel and his students at the University of California at San Diego will combine molecular beam scattering and scanning tunneling microscopy methods to probe the detailed dynamics of the interaction of these molecules, with a view to understanding the long range charge transfer process which accompanies dissociative adsorption. Oriented beam methods will also be used to probe the interaction of pendular states of the interhalogens with the low work function aluminum surface. An understanding of the dissociative adsorption of simple, high electron affinity molecules such as chlorine when interacting with low work function metals such as aluminum is the focus of this research project. Probing the dynamics of this interaction using scattering and surface microscopic methods will provide information about the mechanisms of these reactions, which are important in the processing of electronic materials, and in corrosion processes.