The Effect of Molecular Orientation and Impact Parameter Upon Activated Associative Desorption and Chemisorption
The Effect of Molecular Orientation and Impact Parameter Upon Activated Associative Desorption and Chemisorption
批准号:
9200468
负责人:
Andrew Kummel
金额:
$26.65万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-04-01 至 1995-03-31
中文摘要
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英文摘要
This research project, supported in the Analytical and Surface Chemistry Program, addresses questions of the detailed dynamics of gas-surface interactions. The objectives of the research are to develop an understanding of the detailed dynamics of dissociative chemisorption of simple diatomic molecules, and the recombination and desorption of adsorbed atoms from well characterized solid surfaces. Velocity resolved, polarization sensitive multi-photon ionization detection of scattered diatomic molecules and desorbed molecules resulting from atom recombination will be carried out. Novel studies of chemisorption of monoenergetic, aligned reagents will also be pursued. %%% Dissociation of molecules on surfaces, as well as recombination and desorption of molecules from the surface, are the principal elementary processes which underlie a wide range of important technologies, including catalysis, corrosion, and electronic device fabrication. This research project develops and applies state-of-the-art methods to the study of the detailed dynamics of these elementary processes. The information gained from these studies is essential in developing our basic understanding of these critical technologies.
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财政年份:2003
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ITR: Materials for InAs MOSFETs: The Enabling Transistor for Low Power, 100 GHz+ Information Transfer and Processing
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财政年份:2003
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Binding, Electronic Structure, and Growth of a Passive Interface: Ga203/GaAs(100)
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财政年份:2000
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负责人:Andrew Kummel
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依托单位:
Energy Release, Chemical Selectivity, and Stereochemistry of Interhalogen Reactions with Low Work Function Surfaces
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批准号:0074813
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资助金额:$37.0万
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财政年份:2000
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依托单位:
Remote Dissociation of Halogens and Interhalogens onto Low Work Function Surfaces
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Halogen Passivation of GaAs (100)
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Uniform Monolayer Pealing by Cyclic Etching of Gallium Arsenide (100) and Silicon (100) Surfaces
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项目类别:Continuing Grant
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资助金额:$26.5万
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财政年份:1993
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负责人:Andrew Kummel
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依托单位:
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资助金额:$27.36万
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财政年份:1989
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负责人:Andrew Kummel
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依托单位:
国内基金
海外基金
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