Mechanistic Studies of Plasma Deposition and Etching for Integrated Circuit Materials
集成电路材料等离子沉积与刻蚀机理研究
基本信息
- 批准号:0137664
- 负责人:
- 金额:$ 40万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2002
- 资助国家:美国
- 起止时间:2002-03-15 至 2006-02-28
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The Advanced Materials program in the Division of Chemistry and the Electronic Materials program in the Division of Materials Research make this joint renewal award to Colorado State University. With this award, Professor Ellen Fisher will study detailed chemical and physical mechanisms of plasma-enhanced chemical vapor deposition and plasma etching, and will evaluate surface interactions of radicals produced during plasma processing using spatially resolved laser-induced fluorescence. The PI will evaluate the interactions between plasma and surfaces during processing of integrated circuits using dual beam imaging; will quantify and characterize the radicals formed during this processing; and will develop detailed chemical mechanisms for plasma etching and plasma-enhanced chemical vapor deposition on different substrates. Use of dual beam imaging will be enable to identify and quantitate a number of different processes that are taking place during the plasma processing, and will be able to develop a knowledge base to be useful to the plasma processing and modeling community. The research project will provide excellent opportunity to graduate and undergraduate students in chemistry and material sciences. This project will use dual beam spatially resolved laser-induced fluorescence imaging method to provide quantitative data on radicals produced at surfaces of different substrates during the plasma processing. Information generated will be useful to plasma processing and modeling community for the development of improved and high performance integrated circuits. In addition, the research activity in plasma processing will provide new opportunity to graduate and undergraduate students in chemistry and materials sciences.
化学系的先进材料项目和材料研究系的电子材料项目将这一联合更新奖授予科罗拉多州立大学。 有了这个奖项,艾伦·费舍尔教授将研究等离子体增强化学气相沉积和等离子体蚀刻的详细化学和物理机制,并将使用空间分辨激光诱导荧光来评估等离子体加工过程中产生的自由基的表面相互作用。 PI将使用双光束成像评估集成电路加工过程中等离子体与表面之间的相互作用;将量化和表征在此加工过程中形成的自由基;并将开发不同基板上等离子体蚀刻和等离子体增强化学气相沉积的详细化学机制。 使用双束成像将能够识别和量化在等离子体处理期间发生的许多不同过程,并且将能够开发对等离子体处理和建模社区有用的知识库。 该研究项目将为化学和材料科学的研究生和本科生提供极好的机会。 本项目将采用双光束空间分辨激光诱导荧光成像方法,提供等离子体处理过程中不同衬底表面产生的自由基的定量数据。 所产生的信息将是有用的等离子体处理和建模社区的改进和高性能集成电路的发展。 此外,等离子体处理的研究活动将为化学和材料科学的研究生和本科生提供新的机会。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Ellen Fisher其他文献
The Hopkins Symptom Checklist. Assessing emotional distress in obstetric-gynecologic practice.
霍普金斯症状清单。
- DOI:
- 发表时间:
1976 - 期刊:
- 影响因子:1.9
- 作者:
Karl Rickels;Celso;Ronald S. Lipman;Derogatis Lr;Ellen Fisher - 通讯作者:
Ellen Fisher
Ellen Fisher的其他文献
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{{ truncateString('Ellen Fisher', 18)}}的其他基金
Unraveling Plasma-Assisted Catalysis: Toward Understanding Fundamental Molecule-Surface Interactions and Energy Partitioning Synergisms
揭示等离子体辅助催化:理解基本的分子-表面相互作用和能量分配协同作用
- 批准号:
1803067 - 财政年份:2018
- 资助金额:
$ 40万 - 项目类别:
Standard Grant
Systematic Studies of the Dynamics, Energetics, and Surface Interactions of Plasma Species during Materials Processing
材料加工过程中等离子体物质的动力学、能量学和表面相互作用的系统研究
- 批准号:
1152963 - 财政年份:2012
- 资助金额:
$ 40万 - 项目类别:
Standard Grant
Toward Fundamental Understanding of Plasma Processing Mechanisms: In Situ Studies of the Gas-Surface Interface During Materials Deposition and Modification
对等离子体处理机制的基本理解:材料沉积和改性过程中气体-表面界面的原位研究
- 批准号:
0911248 - 财政年份:2009
- 资助金额:
$ 40万 - 项目类别:
Continuing Grant
REU Site: Materials Chemistry Research: Synthesis, Characterization, and Device Fabrication
REU 网站:材料化学研究:合成、表征和器件制造
- 批准号:
0649263 - 财政年份:2007
- 资助金额:
$ 40万 - 项目类别:
Continuing Grant
Toward Fundamental Understanding: Correlating the Gas-Phase, Surface, and Gas-Surface Interface in Halogenated Plasma Systems
迈向基本理解:关联卤化等离子体系统中的气相、表面和气体-表面界面
- 批准号:
0613653 - 财政年份:2006
- 资助金额:
$ 40万 - 项目类别:
Continuing Grant
Acquisition of an Integrated Scanning Electron Microscope System
购置集成扫描电子显微镜系统
- 批准号:
0114093 - 财政年份:2001
- 资助金额:
$ 40万 - 项目类别:
Standard Grant
Acquisition of XPS Instrumentation for a Departmental Materials Characterization Facility
为部门材料表征设施购置 XPS 仪器
- 批准号:
9977398 - 财政年份:1999
- 资助金额:
$ 40万 - 项目类别:
Standard Grant
POWRE: Resonantly Enhanced Multiphoton Ionization for Measurement of Radical-Surface Reactivities
POWRE:用于测量自由基表面反应性的共振增强多光子电离
- 批准号:
9805815 - 财政年份:1998
- 资助金额:
$ 40万 - 项目类别:
Standard Grant
Investigation of Plasma Deposition and Etching Mechanisms for Silicon-based Materials
硅基材料的等离子体沉积和刻蚀机理研究
- 批准号:
9812332 - 财政年份:1998
- 资助金额:
$ 40万 - 项目类别:
Continuing Grant
Investigation of Plasma Deposition Mechanisms for Silicon Dioxide and Silicon Nitride Films
二氧化硅和氮化硅薄膜的等离子体沉积机理研究
- 批准号:
9501157 - 财政年份:1995
- 资助金额:
$ 40万 - 项目类别:
Continuing Grant
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