Mechanistic Studies of Plasma Deposition and Etching for Integrated Circuit Materials

集成电路材料等离子沉积与刻蚀机理研究

基本信息

批准号：
0137664
负责人：
Ellen Fisher
金额：
$ 40万
依托单位：
Colorado State University
依托单位国家：
美国
项目类别：
Continuing Grant
财政年份：
2002
资助国家：
美国
起止时间：
2002-03-15 至 2006-02-28
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=0137664&HistoricalAwards=false
关键词：
Mechanistic Studies Plasma Deposition Etching

项目摘要

The Advanced Materials program in the Division of Chemistry and the Electronic Materials program in the Division of Materials Research make this joint renewal award to Colorado State University. With this award, Professor Ellen Fisher will study detailed chemical and physical mechanisms of plasma-enhanced chemical vapor deposition and plasma etching, and will evaluate surface interactions of radicals produced during plasma processing using spatially resolved laser-induced fluorescence. The PI will evaluate the interactions between plasma and surfaces during processing of integrated circuits using dual beam imaging; will quantify and characterize the radicals formed during this processing; and will develop detailed chemical mechanisms for plasma etching and plasma-enhanced chemical vapor deposition on different substrates. Use of dual beam imaging will be enable to identify and quantitate a number of different processes that are taking place during the plasma processing, and will be able to develop a knowledge base to be useful to the plasma processing and modeling community. The research project will provide excellent opportunity to graduate and undergraduate students in chemistry and material sciences. This project will use dual beam spatially resolved laser-induced fluorescence imaging method to provide quantitative data on radicals produced at surfaces of different substrates during the plasma processing. Information generated will be useful to plasma processing and modeling community for the development of improved and high performance integrated circuits. In addition, the research activity in plasma processing will provide new opportunity to graduate and undergraduate students in chemistry and materials sciences.

材料研究部化学和电子材料计划的高级材料计划授予科罗拉多州立大学的联合续签奖。通过该奖项，艾伦·费舍尔（Ellen Fisher）教授将研究血浆增强化学蒸气沉积和血浆蚀刻的详细化学和物理机制，并将使用空间分辨激光诱导的荧光来评估血浆处理过程中产生的自由基的表面相互作用。 PI将使用双光束成像在处理集成电路过程中评估血浆与表面之间的相互作用；将量化和表征此过程中形成的自由基；并将开发出在不同底物上的等离子体蚀刻和血浆增强化学蒸气沉积的详细化学机制。双光束成像的使用将可以识别和量化等离子体处理过程中发生的许多不同过程，并能够建立知识库以对等离子体处理和建模社区有用。该研究项目将为化学和物质科学的毕业和本科生提供绝佳的机会。该项目将使用双光束空间分辨激光诱导的荧光成像方法来提供有关等离子体处理过程中不同底物表面产生的自由基的定量数据。生成的信息将对等离子体处理和建模社区有用，以开发改进和高性能集成电路。此外，血浆处理中的研究活动将为化学和材料科学的毕业生提供新的机会。