Mechanistic Studies of Plasma Deposition and Etching for Integrated Circuit Materials

化学部门的先进材料项目和材料研究部门的电子材料项目将此联合更新奖授予科罗拉多州立大学。获得该奖项后，Ellen Fisher教授将研究等离子体增强化学气相沉积和等离子体蚀刻的详细化学和物理机制，并将利用空间分辨激光诱导荧光技术评估等离子体处理过程中产生的自由基的表面相互作用。PI将使用双光束成像评估集成电路加工过程中等离子体和表面之间的相互作用；将量化和表征在此过程中形成的自由基；并将开发详细的化学机制，等离子体蚀刻和等离子体增强化学气相沉积在不同的衬底。使用双光束成像将能够识别和量化等离子体处理过程中发生的许多不同过程，并将能够开发一个知识库，对等离子体处理和建模社区有用。该研究项目将为化学和材料科学专业的研究生和本科生提供极好的机会。本项目将采用双光束空间分辨激光诱导荧光成像方法，对等离子体加工过程中不同基底表面产生的自由基提供定量数据。所产生的信息将有助于等离子体处理和建模社区对改进和高性能集成电路的发展。此外，等离子体处理的研究活动将为化学和材料科学的研究生和本科生提供新的机会。

The Advanced Materials program in the Division of Chemistry and the Electronic Materials program in the Division of Materials Research make this joint renewal award to Colorado State University. With this award, Professor Ellen Fisher will study detailed chemical and physical mechanisms of plasma-enhanced chemical vapor deposition and plasma etching, and will evaluate surface interactions of radicals produced during plasma processing using spatially resolved laser-induced fluorescence. The PI will evaluate the interactions between plasma and surfaces during processing of integrated circuits using dual beam imaging; will quantify and characterize the radicals formed during this processing; and will develop detailed chemical mechanisms for plasma etching and plasma-enhanced chemical vapor deposition on different substrates. Use of dual beam imaging will be enable to identify and quantitate a number of different processes that are taking place during the plasma processing, and will be able to develop a knowledge base to be useful to the plasma processing and modeling community. The research project will provide excellent opportunity to graduate and undergraduate students in chemistry and material sciences. This project will use dual beam spatially resolved laser-induced fluorescence imaging method to provide quantitative data on radicals produced at surfaces of different substrates during the plasma processing. Information generated will be useful to plasma processing and modeling community for the development of improved and high performance integrated circuits. In addition, the research activity in plasma processing will provide new opportunity to graduate and undergraduate students in chemistry and materials sciences.