Systematic Studies of the Dynamics, Energetics, and Surface Interactions of Plasma Species during Materials Processing
材料加工过程中等离子体物质的动力学、能量学和表面相互作用的系统研究
基本信息
- 批准号:1152963
- 负责人:
- 金额:$ 50万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2012
- 资助国家:美国
- 起止时间:2012-08-15 至 2016-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this award, funded by the Chemical Structure, Dynamics and Mechanisms Program of the Division of Chemistry, Professor Fisher from Colorado State University will investigate the effect of plasma modification processes on surfaces. Plasma processing has become indispensable in a wide range of applications where high performance materials with tailored surface properties are employed. Moreover, development of new plasma surface modification processes and deposition chemistries is a burgeoning area with impact on biomaterials, coatings, and sensor applications. A more complete understanding of the underlying chemistry in these systems could lead to manufacturing improvements with economic impact across many industries. Thus, the goal of the proposed work is to improve understanding of the fundamental chemical processes that occur at surfaces during plasma enhanced chemical vapor deposition and surface modification of polymers. Professor Fisher and her students will achieve this goal through an integrated, comprehensive approach to understanding the molecular-level chemistry in these systems. The primary experimental tools to be employed are in situ sum frequency generation (SFG) spectroscopy and the laser-based imaging of radicals interacting with surfaces (IRIS) technique, which provides steady-state surface interaction data for plasma species. The SFG experiments are designed to examine the evolution of plasma modified films upon exposure to atmospheric gases to study labile intermediates formed in plasma modification, thereby elucidating mechanisms involved in aging and hydrophobic recovery processes. Plasma processing is used to prepare high performance materials with tailored surface properties. These materials are used in many fields and industries including computational science, information processing, data management, sensor fabrication and communications. In this project, Prof. Fisher and her students will use a combination of experimental tools to study plasma processing. The results will enable the development of new materials and the improvement of existing ones. The intrinsic interdisciplinary nature of this research will afford students a broad exposure to and education in chemistry, engineering, and materials science, beyond the traditional boundaries in chemistry. Professor Fisher will continue her efforts in broadening participation of underrepresented groups and use the proposed experiments to develop demonstrations of plasmas and lasers for visitors, high school groups and K-12 teachers.
在该奖项中,由化学结构,动力学和机制计划资助,科罗拉多州立大学的费舍尔教授将研究血浆修饰过程对表面的影响。在采用具有量身定制表面特性的高性能材料的广泛应用中,血浆处理已成为必不可少的。此外,新的等离子体表面修饰过程和沉积化学的发展是一个新兴的区域,对生物材料,涂料和传感器应用产生影响。对这些系统中的基本化学反应的更全面了解可能会导致制造改进,并在许多行业中经济影响。因此,提议的工作的目的是提高对血浆增强化学蒸气沉积和聚合物表面修饰期间在表面上发生的基本化学过程的理解。费舍尔教授和她的学生将通过一种综合,全面的方法来了解这些系统中的分子级化学反应。要使用的主要实验工具是原位总和频率产生(SFG)光谱和基于激光的基于激光与表面(IRIS)技术相互作用的激光成像,该技术提供了血浆物种的稳态表面交互数据。 SFG实验旨在检查血浆改性膜在暴露于大气气体时的演变,以研究血浆修饰中形成的不稳定中间体,从而阐明了与衰老和疏水恢复过程有关的机制。血浆处理用于制备具有量身定制的表面特性的高性能材料。 这些材料用于许多领域和行业,包括计算科学,信息处理,数据管理,传感器制造和通信。 在这个项目中,Fisher教授和她的学生将使用多种实验工具来研究血浆处理。 结果将使新材料的开发和现有材料的改进。 这项研究的内在跨学科性质将为学生提供广泛的化学,工程和材料科学教育,超出了化学的传统界限。费舍尔教授将继续努力扩大代表性不足的团体的参与,并使用拟议的实验为访客,高中团体和K-12老师提供等离子体和激光的演示。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Ellen Fisher其他文献
The Hopkins Symptom Checklist. Assessing emotional distress in obstetric-gynecologic practice.
霍普金斯症状清单。
- DOI:
- 发表时间:
1976 - 期刊:
- 影响因子:1.9
- 作者:
Karl Rickels;Celso;Ronald S. Lipman;Derogatis Lr;Ellen Fisher - 通讯作者:
Ellen Fisher
Ellen Fisher的其他文献
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{{ truncateString('Ellen Fisher', 18)}}的其他基金
Unraveling Plasma-Assisted Catalysis: Toward Understanding Fundamental Molecule-Surface Interactions and Energy Partitioning Synergisms
揭示等离子体辅助催化:理解基本的分子-表面相互作用和能量分配协同作用
- 批准号:
1803067 - 财政年份:2018
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
Toward Fundamental Understanding of Plasma Processing Mechanisms: In Situ Studies of the Gas-Surface Interface During Materials Deposition and Modification
对等离子体处理机制的基本理解:材料沉积和改性过程中气体-表面界面的原位研究
- 批准号:
0911248 - 财政年份:2009
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
REU Site: Materials Chemistry Research: Synthesis, Characterization, and Device Fabrication
REU 网站:材料化学研究:合成、表征和器件制造
- 批准号:
0649263 - 财政年份:2007
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Toward Fundamental Understanding: Correlating the Gas-Phase, Surface, and Gas-Surface Interface in Halogenated Plasma Systems
迈向基本理解:关联卤化等离子体系统中的气相、表面和气体-表面界面
- 批准号:
0613653 - 财政年份:2006
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Mechanistic Studies of Plasma Deposition and Etching for Integrated Circuit Materials
集成电路材料等离子沉积与刻蚀机理研究
- 批准号:
0137664 - 财政年份:2002
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Acquisition of an Integrated Scanning Electron Microscope System
购置集成扫描电子显微镜系统
- 批准号:
0114093 - 财政年份:2001
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
Acquisition of XPS Instrumentation for a Departmental Materials Characterization Facility
为部门材料表征设施购置 XPS 仪器
- 批准号:
9977398 - 财政年份:1999
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
POWRE: Resonantly Enhanced Multiphoton Ionization for Measurement of Radical-Surface Reactivities
POWRE:用于测量自由基表面反应性的共振增强多光子电离
- 批准号:
9805815 - 财政年份:1998
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
Investigation of Plasma Deposition and Etching Mechanisms for Silicon-based Materials
硅基材料的等离子体沉积和刻蚀机理研究
- 批准号:
9812332 - 财政年份:1998
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Investigation of Plasma Deposition Mechanisms for Silicon Dioxide and Silicon Nitride Films
二氧化硅和氮化硅薄膜的等离子体沉积机理研究
- 批准号:
9501157 - 财政年份:1995
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
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