Systematic Studies of the Dynamics, Energetics, and Surface Interactions of Plasma Species during Materials Processing
材料加工过程中等离子体物质的动力学、能量学和表面相互作用的系统研究
基本信息
- 批准号:1152963
- 负责人:
- 金额:$ 50万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2012
- 资助国家:美国
- 起止时间:2012-08-15 至 2016-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this award, funded by the Chemical Structure, Dynamics and Mechanisms Program of the Division of Chemistry, Professor Fisher from Colorado State University will investigate the effect of plasma modification processes on surfaces. Plasma processing has become indispensable in a wide range of applications where high performance materials with tailored surface properties are employed. Moreover, development of new plasma surface modification processes and deposition chemistries is a burgeoning area with impact on biomaterials, coatings, and sensor applications. A more complete understanding of the underlying chemistry in these systems could lead to manufacturing improvements with economic impact across many industries. Thus, the goal of the proposed work is to improve understanding of the fundamental chemical processes that occur at surfaces during plasma enhanced chemical vapor deposition and surface modification of polymers. Professor Fisher and her students will achieve this goal through an integrated, comprehensive approach to understanding the molecular-level chemistry in these systems. The primary experimental tools to be employed are in situ sum frequency generation (SFG) spectroscopy and the laser-based imaging of radicals interacting with surfaces (IRIS) technique, which provides steady-state surface interaction data for plasma species. The SFG experiments are designed to examine the evolution of plasma modified films upon exposure to atmospheric gases to study labile intermediates formed in plasma modification, thereby elucidating mechanisms involved in aging and hydrophobic recovery processes. Plasma processing is used to prepare high performance materials with tailored surface properties. These materials are used in many fields and industries including computational science, information processing, data management, sensor fabrication and communications. In this project, Prof. Fisher and her students will use a combination of experimental tools to study plasma processing. The results will enable the development of new materials and the improvement of existing ones. The intrinsic interdisciplinary nature of this research will afford students a broad exposure to and education in chemistry, engineering, and materials science, beyond the traditional boundaries in chemistry. Professor Fisher will continue her efforts in broadening participation of underrepresented groups and use the proposed experiments to develop demonstrations of plasmas and lasers for visitors, high school groups and K-12 teachers.
该奖项由化学学部化学结构、动力学和机制项目资助,来自科罗拉多州立大学的Fisher教授将研究等离子体修饰过程对表面的影响。等离子体加工在广泛的应用中已经成为不可缺少的,在这些应用中,采用了具有定制表面特性的高性能材料。此外,新的等离子体表面改性工艺和沉积化学的发展是一个新兴的领域,对生物材料,涂层和传感器应用产生了影响。更全面地了解这些系统中潜在的化学成分,可能会导致许多行业的制造改进和经济影响。因此,所提出的工作的目标是提高对等离子体增强化学气相沉积和聚合物表面改性过程中发生在表面的基本化学过程的理解。Fisher教授和她的学生将通过综合、全面的方法来理解这些系统中的分子水平化学,从而实现这一目标。采用的主要实验工具是原位和频率产生(SFG)光谱和基于自由基与表面相互作用的激光成像(IRIS)技术,该技术提供了等离子体物种的稳态表面相互作用数据。SFG实验旨在研究等离子体修饰膜在暴露于大气气体时的演变,以研究等离子体修饰过程中形成的不稳定中间体,从而阐明老化和疏水恢复过程的机制。等离子体加工用于制备具有定制表面性能的高性能材料。这些材料用于许多领域和行业,包括计算科学,信息处理,数据管理,传感器制造和通信。在这个项目中,Fisher教授和她的学生将使用多种实验工具来研究等离子体处理。研究结果将有助于新材料的开发和现有材料的改进。本研究内在的跨学科性质将为学生提供化学、工程和材料科学方面的广泛接触和教育,超越化学的传统界限。费希尔教授将继续努力扩大代表性不足的群体的参与,并利用拟议的实验为游客、高中团体和K-12教师开发等离子体和激光的演示。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Ellen Fisher其他文献
The Hopkins Symptom Checklist. Assessing emotional distress in obstetric-gynecologic practice.
霍普金斯症状清单。
- DOI:
- 发表时间:
1976 - 期刊:
- 影响因子:1.9
- 作者:
Karl Rickels;Celso;Ronald S. Lipman;Derogatis Lr;Ellen Fisher - 通讯作者:
Ellen Fisher
Ellen Fisher的其他文献
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{{ truncateString('Ellen Fisher', 18)}}的其他基金
Unraveling Plasma-Assisted Catalysis: Toward Understanding Fundamental Molecule-Surface Interactions and Energy Partitioning Synergisms
揭示等离子体辅助催化:理解基本的分子-表面相互作用和能量分配协同作用
- 批准号:
1803067 - 财政年份:2018
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
Toward Fundamental Understanding of Plasma Processing Mechanisms: In Situ Studies of the Gas-Surface Interface During Materials Deposition and Modification
对等离子体处理机制的基本理解:材料沉积和改性过程中气体-表面界面的原位研究
- 批准号:
0911248 - 财政年份:2009
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
REU Site: Materials Chemistry Research: Synthesis, Characterization, and Device Fabrication
REU 网站:材料化学研究:合成、表征和器件制造
- 批准号:
0649263 - 财政年份:2007
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Toward Fundamental Understanding: Correlating the Gas-Phase, Surface, and Gas-Surface Interface in Halogenated Plasma Systems
迈向基本理解:关联卤化等离子体系统中的气相、表面和气体-表面界面
- 批准号:
0613653 - 财政年份:2006
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Mechanistic Studies of Plasma Deposition and Etching for Integrated Circuit Materials
集成电路材料等离子沉积与刻蚀机理研究
- 批准号:
0137664 - 财政年份:2002
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Acquisition of an Integrated Scanning Electron Microscope System
购置集成扫描电子显微镜系统
- 批准号:
0114093 - 财政年份:2001
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
Acquisition of XPS Instrumentation for a Departmental Materials Characterization Facility
为部门材料表征设施购置 XPS 仪器
- 批准号:
9977398 - 财政年份:1999
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
POWRE: Resonantly Enhanced Multiphoton Ionization for Measurement of Radical-Surface Reactivities
POWRE:用于测量自由基表面反应性的共振增强多光子电离
- 批准号:
9805815 - 财政年份:1998
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
Investigation of Plasma Deposition and Etching Mechanisms for Silicon-based Materials
硅基材料的等离子体沉积和刻蚀机理研究
- 批准号:
9812332 - 财政年份:1998
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
Investigation of Plasma Deposition Mechanisms for Silicon Dioxide and Silicon Nitride Films
二氧化硅和氮化硅薄膜的等离子体沉积机理研究
- 批准号:
9501157 - 财政年份:1995
- 资助金额:
$ 50万 - 项目类别:
Continuing Grant
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