Atomic Layer Epitaxy of Conducting Oxides and Heterostructures

西北大学化学学部先进材料项目（MPS）和材料研究部电子材料项目（MPS）联合授予西北大学的这一奖项是为了合成新的大环含氮聚酮/聚酮亚胺配合物，以及具有极性金属-碳和金属-氮键的金属烷基和二烷基酰胺，用于传统的脉冲有机金属束外延的前驱体。以及原子层外延膜的生长工艺。有了这个奖项，Chang教授和Marks教授将研究前驱体分子结构-挥发性-热稳定性-表面反应性关系，从而产生更有效的前驱体。利用精密脉冲气相沉积技术，将这些前驱体生长出透明的导电氧化物薄膜，这些薄膜将在平板显示器和光伏设备中有潜在的应用。将研究含有氧化掺杂剂的晶格匹配立方薄膜系统，利用气相沉积在自组装的单层模板上生产高效的p型导体薄膜，以创建所需的薄膜微结构、光学和电学功能。这种高度合作的努力将把材料科学和化学研究小组聚集在一起，为研究生和博士后提供教育和研究机会。凭借该奖项，将制备具有极性金属-碳和金属-氮键的新型前驱体，用于传统和精密脉冲气相沉积工艺，以制备导电氧化物的透明薄膜。这些前驱体有望具有最佳的分子结构、挥发性、热稳定性和表面反应性，用于导电氧化物透明薄膜的沉积。通过软光刻和无位错岛的相干生长，制备了亚微米和纳米尺度的氧化膜。

This joint award made to Northwestern University by the Advanced Materials Program in the Division of Chemistry (MPS) and the Electronic Materials Program in the Division of Materials Research (MPS) is to synthesize new macrocyclic nitrogenous polyketonato/polyketoiminato complexes as well as metal alkyls and dialkylamides with polar metal-carbon and metal-nitrogen linkages for use as precursors in conventional, pulsed organometallic beam epitaxy, and atomic layer epitaxy film growth processes. With this award, Professors Chang and Marks will study precursor molecular architecture-volatility-thermal stability-surface reactivity relationships leading to more effective precursors. Transparent thin films of conducting oxides will be grown from these precursors using precision-pulsed vapor deposition techniques, and these thin films would have potential applications in flat-panel display and photovoltaic devices. Lattice-matched cubic film systems with oxidative dopants will be studied for producing efficient p-type conductor films using vapor phase deposition onto self-assembled monolayer templates to create desired film microstructural, optical and electrical functionalities. This highly collaborative effort will bring together materials science and chemistry research groups with educational and research opportunities for graduate and postdoctoral students.With this award, novel precursors with polar metal-carbon and metal-nitrogen linkages will be prepared for use in conventional and precision-pulsed vapor deposition processes to prepare transparent thin films of conducting oxides. These precursors are expected to possess optimum molecular architecture, volatility, thermal stability and surface reactivity for the deposition of transparent thin films of conducting oxides. Sub-micrometer and nanometer scale patterns of the oxide films by soft lithography and coherent growth of dislocation-free islands will also be prepared.