Atomic Layer Epitaxy of Conducting Oxides and Heterostructures

西北大学化学系（MPS）的先进材料计划和材料研究系（MPS）的电子材料计划联合授予西北大学的这一奖项是合成新的大环含氮聚酮/聚酮亚胺配合物以及具有极性金属-碳和金属-氮键的金属烷基和二烷基酰胺，用作常规脉冲有机金属束外延的前体，和原子层外延膜生长工艺。 有了这个奖项，张教授和马克斯将研究前体分子结构-挥发性-热稳定性-表面反应性的关系，导致更有效的前体。利用精密脉冲气相沉积技术可以从这些前驱体中生长出透明的导电氧化物薄膜，这些薄膜在平板显示器和光伏器件中具有潜在的应用。晶格匹配的立方膜系统与氧化掺杂剂将被研究用于生产高效的p型导体膜，使用气相沉积到自组装单层模板上，以创建所需的膜微观结构，光学和电学功能。 这一高度合作的成果将使材料科学和化学研究小组聚集在一起，为研究生和博士后提供教育和研究机会。有了这个奖项，将制备具有极性金属-碳和金属-氮键的新型前体，用于传统和精密脉冲气相沉积工艺，制备导电氧化物的透明薄膜。 这些前体有望具有最佳的分子结构，挥发性，热稳定性和表面活性的导电氧化物的透明薄膜的沉积。我们也将利用软微影技术制作出亚微米与奈米尺度的氧化膜图案，并借由无位错岛的共格成长。

This joint award made to Northwestern University by the Advanced Materials Program in the Division of Chemistry (MPS) and the Electronic Materials Program in the Division of Materials Research (MPS) is to synthesize new macrocyclic nitrogenous polyketonato/polyketoiminato complexes as well as metal alkyls and dialkylamides with polar metal-carbon and metal-nitrogen linkages for use as precursors in conventional, pulsed organometallic beam epitaxy, and atomic layer epitaxy film growth processes. With this award, Professors Chang and Marks will study precursor molecular architecture-volatility-thermal stability-surface reactivity relationships leading to more effective precursors. Transparent thin films of conducting oxides will be grown from these precursors using precision-pulsed vapor deposition techniques, and these thin films would have potential applications in flat-panel display and photovoltaic devices. Lattice-matched cubic film systems with oxidative dopants will be studied for producing efficient p-type conductor films using vapor phase deposition onto self-assembled monolayer templates to create desired film microstructural, optical and electrical functionalities. This highly collaborative effort will bring together materials science and chemistry research groups with educational and research opportunities for graduate and postdoctoral students.With this award, novel precursors with polar metal-carbon and metal-nitrogen linkages will be prepared for use in conventional and precision-pulsed vapor deposition processes to prepare transparent thin films of conducting oxides. These precursors are expected to possess optimum molecular architecture, volatility, thermal stability and surface reactivity for the deposition of transparent thin films of conducting oxides. Sub-micrometer and nanometer scale patterns of the oxide films by soft lithography and coherent growth of dislocation-free islands will also be prepared.