MRI: High Aspect Ratio Etching System for Micro and Nanoscale Sensor and Sensor Systems Applications

MRI：用于微米级和纳米级传感器及传感器系统应用的高深宽比蚀刻系统

• 批准号: 0321099
• 负责人: Srinivas Tadigadapa
• 金额: $ 37.1万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-08-15 至 2004-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0321099&HistoricalAwards=false
• 关键词: MRI; Aspect; Ratio; Etching; System

This Major Research Instrumentation (MRI) award provides funding for an inductively coupled plasma etching system consisting of three process modules: (i) advanced silicon etch module for high etch-rate, high aspect ratio etching of silicon; (ii) oxide etch module for high aspect ratio etching of quartz, silicon dioxide, and other ceramic materials; and (iii) a xenon difluoride vapor phase etching module for isotropic chemical etching of silicon with high selectivity. The instrument will be used by more than 25 research groups in 10 academic departments at Penn State University to conduct research in the areas of microfluidics, biochemical sensors, high-speed switches and nanoscale resonators for radio frequency applications, integration of high-performance piezoelectric and polymeric thin films into silicon microsystems and investigation into fundamental quantum mechanical effects at the nanoscale. It will also be used to develop undergraduate and graduate level laboratory courses in microfabrication techniques as part of a course curriculum in micro and nanosystems technology.The proposed tool configuration will allow researchers at Penn State to develop novel sensors, actuators, and electronic systems for applications ranging from biomedical technology to homeland security. In addition to fostering interdisciplinary research, the tool will provide hands-on fabrication experience to students and will be instrumental in the creation of a workforce skilled in the areas of micro and nanoscale science and technology. The advanced etching capability with the uniquely developed etching processes will attract new research collaborations with industry and national laboratories to Penn State University. The etch tool will also impact the nano-camp and chip-camp programs currently offered for K-12 students on nanoscience and nanotechnology.

这一重大研究仪器奖(MRI)为电感耦合等离子体刻蚀系统提供资金，该系统由三个工艺模块组成：(I)用于高刻蚀速率、高深宽比刻蚀硅的先进硅刻蚀模块；(Ii)用于高深宽比刻蚀石英、二氧化硅和其他陶瓷材料的氧化物刻蚀模块；以及(Iii)用于高选择性各向同性化学刻蚀硅的二氟化氙气相刻蚀模块。该仪器将由宾夕法尼亚州立大学10个学术部门的25个以上研究小组使用，进行以下领域的研究：用于射频应用的微流体、生化传感器、高速开关和纳米谐振器、将高性能压电和聚合物薄膜集成到硅微系统中，以及在纳米尺度上研究基本量子力学效应。它还将用于开发本科生和研究生水平的微制造技术实验室课程，作为微和纳米系统技术课程的一部分。拟议的工具配置将允许宾夕法尼亚州立大学的研究人员开发新型传感器、执行器和电子系统，应用范围从生物医学技术到国土安全。除了促进跨学科研究，该工具还将为学生提供实践制造经验，并将有助于建立一支在微和纳米科学和技术领域熟练的劳动力队伍。先进的蚀刻能力和独特开发的蚀刻工艺将吸引与行业和国家实验室的新研究合作来到宾夕法尼亚州立大学。蚀刻工具还将影响目前为K-12学生提供的纳米科学和纳米技术方面的纳米营和芯片营计划。