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Isotopically Controlled Semiconductors: Diffusion and Nanocrystals

Isotopically Controlled Semiconductors: Diffusion and Nanocrystals
同位素控制半导体:扩散和纳米晶体
批准号:
0405472
负责人:
Eugene Haller
金额:
$0.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-11-01 至 2009-01-31

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中文摘要
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英文摘要
This project addresses (1) the physics of atomic diffusion in crystalline thin film multilayer structures and (2) the properties of nano-particles composed of isotopically controlled semiconductors. Self-diffusion (i.e., isotope inter-diffusion) and dopant diffusion will be studied directly and simultaneously for the first time in strained and relaxed silicon-germanium (SiGe) multi-layer structures. The studies are designed to reveal the physics underlying the various diffusion mechanisms. The expected results will expand the fundamental solid-state knowledge base, may lead to the discovery of new diffusion processes, and will be of direct use to the designers of future SiGe electronic devices. The proposal further addresses the properties of isotopically pure germanium nano-crystals. Selective Neutron Transmutation Doping (NTD) will be used to form acceptors (70Ge) or donors (74Ge). The NTD process looks promising because it occurs at temperatures sufficiently low for the newly formed dopant atoms to remain inside the nanocrystal. Choice of the isotopic composition also allows selection of isotopes with or without nuclear spin. Semiconductors with controlled nuclear spin distribution are of great current interest to the rapidly emerging field of "spintronics." The proposed research offers graduate and undergraduate students training in cutting-edge research in several fields of science and technology.This project addresses (1) the study of diffusion in crystalline thin film multilayer structures and (2) the properties of nano-particles composed of enriched isotopes of the semiconductor elements silicon and germanium. Atom self-diffusion and dopant diffusion are used in several of the key processes used to fabricate modern semiconductor devices ("chips"). The present studies are designed to reveal the atomic-level diffusion mechanisms in mixtures of silicon and germanium. The results will expand the fundamental solid-state knowledge base, and may lead to the discovery of new diffusion processes. The latter will be of direct use to the designers of future very high-speed electronic devices. The proposal further addresses the properties of isotopically pure germanium nano-crystals that have been doped using selective nuclear techniques. Choice of the isotopic composition also allows selection of isotopes with nuclear spin that are of great current interest to the rapidly emerging field of "spintronics." The proposed research offers graduate and undergraduate students training in cutting-edge research in several fields of science and technology.
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Isotopically Controlled Semiconductors: Diffusion and Nanocrystals
  • 批准号:
    0902179
  • 项目类别:
    Standard Grant
  • 资助金额:
    $33.0万
  • 财政年份:
    2009
  • 负责人:
    Eugene Haller
  • 依托单位:
ARI-MA: Collaborative Research: High Z Materials for Nuclear Detection: Synergy of Growth, Characterization and Defect Physics for Room Temperature Devices
  • 批准号:
    0832986
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2008
  • 负责人:
    Eugene Haller
  • 依托单位:
Diffusion Studies and Defect Spectroscopy with Isotopically Controlled Semiconductors
  • 批准号:
    0109844
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2001
  • 负责人:
    Eugene Haller
  • 依托单位:
Diffusion Studies and Defect Spectroscopy with Isotopically Controlled Semiconductors
  • 批准号:
    9732707
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $24.0万
  • 财政年份:
    1998
  • 负责人:
    Eugene Haller
  • 依托单位:
海外基金