Graphene on atomically flat insulating substrates

该项目旨在在清洁、原子有序、电绝缘的衬底（如CaF2、CeO2和金刚石）上制备高质量的石墨烯，并对这些系统的物理性质有基本的了解。研究的重点是石墨烯原子尺度结构特性的表征，以及理解和控制石墨烯与底层衬底的相互作用。石墨烯薄膜的特征是在非接触模式下操作的最高分辨率动态扫描力显微镜（NC AFM）和开尔文探针力显微镜（KPFM）。从薄片边界的原子分辨测量中，我们期望揭示石墨烯薄膜和衬底之间的注册，而湖区的力成像和光谱学预计将获得关于石墨烯薄膜和衬底之间相互作用的信息。项目的主要目标是(1)剥离的石墨烯的改善超高真空产生最高大的单层石墨烯薄片结构完美和统一在绝缘子表面,(2)原子尺度描述的缺陷或根据石墨烯片,并在他们的边界和(3)的研究原子结构和折叠的地方表面潜力石墨烯电影以及与底层的单层膜的注册表。

The project aims at preparing high quality graphene on clean, atomically ordered, electrically insulating substrates such as CaF2, CeO2, and diamond and a fundamental understanding of the physical properties of such systems. The focus of investigations is on the characterisation of graphene atomic scale structural properties as well as understanding and controlling the interaction of graphene with the underlying substrate. Graphene films are characterised by highest resolution dynamic scanning force microscopy operated in the non-contact mode (NC AFM) and Kelvin probe force microscopy (KPFM). From atomically resolved measurements at the border of flakes, we expect to reveal the registry between the graphene film and the substrate while force imaging and spectroscopy on the lake area is expected to yield information about the interaction between the graphene film and the substrate. The main goals for the project are (1) the improvement of the exfoliation of graphene in the ultra-high vacuum to produce large flakes of single layer graphene of highest structural perfection and uniformity on insulator surfaces, (2) the atomic scale characterisation of defects on or under the graphene flakes, and at their borders and (3) the study of the atomic structure and the local surface potential of folded graphene films as well as their registry with the underlying single layer film.