NOVEL HIGH-PERFORMANCE III-N HBTS FOR NEXT-GENERATION ENERGY-EFFICIENT SYSTEMS

适用于下一代节能系统的新型高性能 III-N HBTS

基本信息

  • 批准号:
    0725736
  • 负责人:
  • 金额:
    $ 28.16万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2007
  • 资助国家:
    美国
  • 起止时间:
    2007-09-01 至 2011-08-31
  • 项目状态:
    已结题

项目摘要

ECCS-0725736R. Dupuis, GA Tech Research CorpThe objective of this research is to develop a new high-voltage III-N HBT technology to address the critical need for increased efficiency in current energy use from power electronics perspectives. The approach is to utilize the synergistic combination of team?s unique capabilities, including (1) the commercial-scale III-N MOCVD growth process technology to develop an advanced material technology of nitride-based transistors; (2) the design of optimized high-power device structures and the development of manufacturable fabrication techniques; and (3) detailed Monte-Carlo device simulations to create a new level of technology that can expand the high-voltage circuitry envelop with decades of performance improvements to achieve highly energy efficient electronic systems.Intellectual MeritIII-nitride based heterojunction bipolar transistors (HBTs) proposed in this program will have a potential to create the devices that can offer an increased blocking voltage with a factor of 10 (or higher) and a reduced on-state power loss by a factor of at least 100 times when compared with currently available silicon technologies, which is one of the major issues in demonstrating high-efficiency high-voltage DC-AC conversion.Broader ImpactsThe success in this program will drastically improve the energy utilization efficiency in many high-power usage business sectors. These industry sectors currently are responsible for major electric energy supply or consumption and are suffering high premium on the electric energy loss in power electronics. The proposed III-N HBT technology will offer a much improved semiconductor device alternative to reduce energy loss during circuit switching and voltage conversion.
ECCS-0725736R。这项研究的目标是开发一种新的高压III-N HBT技术,以满足从电力电子学角度提高当前能源使用效率的迫切需求。 方法是利用团队的协同组合?的独特能力,包括(1)商业规模的III-N MOCVD生长工艺技术,以开发氮化物基晶体管的先进材料技术;(2)优化的大功率器件结构的设计和可制造的制造技术的开发;和(3)详细的蒙特-卡罗器件模拟,以创造一个新的技术水平,可以扩大高,本计划提出的基于MeritIII族氮化物的异质结双极晶体管(HBT)将有可能创造出能够提供10%的阻断电压的器件(或更高),并且与当前可用的硅技术相比,导通状态功率损耗至少降低100倍,这是展示高效高压DC-AC转换的主要问题之一。更广泛的影响该计划的成功将大大提高许多高功率使用业务部门的能源利用效率。 这些工业部门目前负责主要的电能供应或消耗,并且在电力电子中的电能损失方面遭受高溢价。 所提出的III-N HBT技术将提供一种大大改进的半导体器件替代方案,以减少电路切换和电压转换期间的能量损耗。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ monograph.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ sciAawards.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ conferencePapers.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ patent.updateTime }}

Russell Dupuis其他文献

Three-dimensional photoluminescence imaging of threading dislocations in GaN by sub-band optical excitation
  • DOI:
    10.1038/s41598-024-83398-0
  • 发表时间:
    2025-01-02
  • 期刊:
  • 影响因子:
    3.900
  • 作者:
    Matthias Daeumer;Jae-Hyuck Yoo;Zhiyu Xu;Minkyu Cho;Marzieh Bakhtiary-Noodeh;Theeradetch Detchprohm;Yuxuan Zhang;Vijay Gopal Thirupakuzi Vangipuram;Vishank Talesara;Yibo Xu;Edward Letts;Daryl Key;Tian T. Li;Qinghui Shao;Russell Dupuis;Shyh-Chiang Shen;Wu Lu;Hongping Zhao;Tadao Hashimoto;Ted A. Laurence
  • 通讯作者:
    Ted A. Laurence

Russell Dupuis的其他文献

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

{{ truncateString('Russell Dupuis', 18)}}的其他基金

International Conference on Metalorganic Vapor Phase Epitaxy (ICMOVPE) XVIII, San Diego CA, July 10-15, 2016
第十八届金属有机气相外延国际会议 (ICMOVPE),加利福尼亚州圣地亚哥,2016 年 7 月 10-15 日
  • 批准号:
    1639797
  • 财政年份:
    2016
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Collaborative Research: Fundamental Studies of the Properties of B-III-N Wide-Bandgap Semiconductor Alloys
合作研究:B-III-N宽带隙半导体合金性能的基础研究
  • 批准号:
    1410874
  • 财政年份:
    2014
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant
International Symposium on the Growth of III-Nitrides (ISGN: Held in Atlanta, GA May 18-22, 2014
III 族氮化物生长国际研讨会(ISGN:2014 年 5 月 18-22 日在佐治亚州亚特兰大举行
  • 批准号:
    1439509
  • 财政年份:
    2014
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
COLLABORATIVE RESEARCH: Nanobeam Lasers
合作研究:纳米束激光器
  • 批准号:
    1028563
  • 财政年份:
    2010
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Infrared Quantum-Cascade Lasers Based Upon III-V Nitride Heterostructures
基于 III-V 族氮化物异质结构的红外量子级联激光器
  • 批准号:
    0439270
  • 财政年份:
    2004
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant
GOALI: Growth of GaSb-Related Materials and Devices by Metalorganic Chemical Vapor Deposition for Advanced Optical Fiber Communication Applications
GOALI:通过金属有机化学气相沉积生长 GaSb 相关材料和器件,用于先进光纤通信应用
  • 批准号:
    0439616
  • 财政年份:
    2003
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Growth and Characterization of Wide-Bandgap Self-Assembled Quantum Dots for Optoelectronic Devices
用于光电器件的宽带隙自组装量子点的生长和表征
  • 批准号:
    0438111
  • 财政年份:
    2003
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant
GOALI: Growth of GaSb-Related Materials and Devices by Metalorganic Chemical Vapor Deposition for Advanced Optical Fiber Communication Applications
GOALI:通过金属有机化学气相沉积生长 GaSb 相关材料和器件,用于先进光纤通信应用
  • 批准号:
    0115329
  • 财政年份:
    2001
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Growth and Characterization of Wide-Bandgap Self-Assembled Quantum Dots for Optoelectronic Devices
用于光电器件的宽带隙自组装量子点的生长和表征
  • 批准号:
    0080630
  • 财政年份:
    2000
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant
Infrared Quantum-Cascade Lasers Based Upon III-V Nitride Heterostructures
基于 III-V 族氮化物异质结构的红外量子级联激光器
  • 批准号:
    0080409
  • 财政年份:
    2000
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant

相似海外基金

Collaborative Research: III: Small: High-Performance Scheduling for Modern Database Systems
协作研究:III:小型:现代数据库系统的高性能调度
  • 批准号:
    2322973
  • 财政年份:
    2024
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Collaborative Research: III: Small: High-Performance Scheduling for Modern Database Systems
协作研究:III:小型:现代数据库系统的高性能调度
  • 批准号:
    2322974
  • 财政年份:
    2024
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Collaborative Research: FuSe: Heterogeneous Integration of III-Nitride and Boron Arsenide for Enhanced Thermal and Electronic Performance
合作研究:FuSe:III族氮化物和砷化硼的异质集成以增强热和电子性能
  • 批准号:
    2329109
  • 财政年份:
    2023
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Collaborative Research: FuSe: Heterogeneous Integration of III-Nitride and Boron Arsenide for Enhanced Thermal and Electronic Performance
合作研究:FuSe:III族氮化物和砷化硼的异质集成以增强热和电子性能
  • 批准号:
    2329110
  • 财政年份:
    2023
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Collaborative Research: FuSe: Heterogeneous Integration of III-Nitride and Boron Arsenide for Enhanced Thermal and Electronic Performance
合作研究:FuSe:III族氮化物和砷化硼的异质集成以增强热和电子性能
  • 批准号:
    2329107
  • 财政年份:
    2023
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant
Collaborative Research: FuSe: Heterogeneous Integration of III-Nitride and Boron Arsenide for Enhanced Thermal and Electronic Performance
合作研究:FuSe:III族氮化物和砷化硼的异质集成以增强热和电子性能
  • 批准号:
    2329108
  • 财政年份:
    2023
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Continuing Grant
EAGER: III: Learning with less data: Capitalizing on formal pedagogies and human performance to incorporate domain knowledge into deep learning models
EAGER:III:用更少的数据学习:利用正规教学法和人类表现将领域知识纳入深度学习模型
  • 批准号:
    2228910
  • 财政年份:
    2022
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
Porous germanium Efficient Epitaxial LayEr Release (PEELER) for low cost high performance III-V solar cells
用于低成本高性能 III-V 太阳能电池的多孔锗高效外延层释放 (PEELER)
  • 批准号:
    537960-2018
  • 财政年份:
    2021
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Collaborative Research and Development Grants
Porous germanium Efficient Epitaxial LayEr Release (PEELER) for low cost high performance III-V solar cells
用于低成本高性能 III-V 太阳能电池的多孔锗高效外延层释放 (PEELER)
  • 批准号:
    537960-2018
  • 财政年份:
    2020
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Collaborative Research and Development Grants
III: Small: A Submodular Framework for Scalable Graph Matching with Performance Guarantees
III:小型:具有性能保证的可扩展图匹配的子模块框架
  • 批准号:
    1908070
  • 财政年份:
    2019
  • 资助金额:
    $ 28.16万
  • 项目类别:
    Standard Grant
{{ showInfoDetail.title }}

作者:{{ showInfoDetail.author }}

知道了