Study of Reliability and Modeling for Process Optimization and Yield Improvements in Chemical Mechanical Planarization
化学机械平坦化工艺优化和产量提高的可靠性和建模研究
基本信息
- 批准号:0727320
- 负责人:
- 金额:$ 30万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2007
- 资助国家:美国
- 起止时间:2007-09-01 至 2012-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The objective of this research is to optimize the chemical mechanical planarization process using experimental evaluation of mechanical reliability of low dielectric constant materials. Extensive post surface metrology, mechanical and interfacial analysis of the materials, and consumables like pad and slurry used in polishing will be done to gain a fundamental analysis of the planarization process from different perspectives. The research will investigate the roles played by the consumables on surface defect generation at the fundamental level. This investigation will allow optimization of pad design, material selection, process pressure, orbital and linear speed, chemical solution, within wafer uniformity and local planarization. Modeling of interfacial adhesion will allow optimization of process conditions, pad physical properties, and chemical additives in order to reduce within uniformity and delamination of thin film stacks. Reliability issues related to dielectric materials will provide an optimal solution for improved yield without compromising the throughput.If successful, the finding of this investigation will result in improved equipment and process designs as well as significant reduction in design cycle time and cost. The research will have a profound impact on integration, device yield, and consumables development resulting in a significant economic payoff. The research will be integrated into existing and new courses in the investigators program and other steps will be taken to stimulate the interest of undergraduates and minority student engineers in microelectronics industries. The results will be disseminated in a timely manner through presentation at national/international conferences and publications in archival journals.
本研究的目的是通过低介电常数材料机械可靠性的实验评估来优化化学机械平坦化工艺。将对材料以及抛光中使用的垫和浆料等消耗品进行广泛的后表面计量、机械和界面分析,以便从不同角度对平坦化过程进行基本分析。该研究将从根本上调查消耗品对表面缺陷产生的作用。这项研究将允许优化焊盘设计、材料选择、工艺压力、轨道和线速度、化学溶液、晶圆均匀性和局部平坦化。界面粘附力建模将允许优化工艺条件、垫物理特性和化学添加剂,以减少薄膜堆栈的均匀性和分层。与介电材料相关的可靠性问题将为在不影响产量的情况下提高产量提供最佳解决方案。如果成功,本次调查的结果将改进设备和工艺设计,并显着缩短设计周期时间和成本。该研究将对集成、设备良率和消耗品开发产生深远影响,从而产生显着的经济回报。该研究将被纳入研究者计划的现有课程和新课程中,并将采取其他措施来激发本科生和少数族裔学生工程师对微电子行业的兴趣。研究结果将通过在国内/国际会议上发表和在档案期刊上发表来及时传播。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Ashok Kumar其他文献
Use of high-resolution IKONOS data and GIS technique for transformation of landuse/landcover for sustainable development.
使用高分辨率 IKONOS 数据和 GIS 技术来改造土地利用/土地覆盖,以实现可持续发展。
- DOI:
- 发表时间:
2010 - 期刊:
- 影响因子:1
- 作者:
P. Kunwar;T. S. Kachhwaha;Ashok Kumar;A. Agrawal;Amrita Singh;N. Mendiratta - 通讯作者:
N. Mendiratta
Cerebral blood flow velocity in asymptomatic premature neonates exposed to clinical chorioamnionitis
临床绒毛膜羊膜炎无症状早产儿脑血流速度
- DOI:
- 发表时间:
2014 - 期刊:
- 影响因子:0
- 作者:
S. Basu;S. Dewangan;S. Barman;S. Anupurba;R. Shukla;Ashok Kumar - 通讯作者:
Ashok Kumar
A minimally-invasive cryogel based approach for the development of human ectopic liver in a mouse model.
一种基于微创冷冻凝胶的方法,用于在小鼠模型中发育人类异位肝脏。
- DOI:
10.1002/jbm.b.34454 - 发表时间:
2020 - 期刊:
- 影响因子:0
- 作者:
J. Kumari;A. Teotia;A. Karande;Ashok Kumar - 通讯作者:
Ashok Kumar
A rare association of hydranencephaly with congenital rubella syndrome.
积水脑畸形与先天性风疹综合征的罕见关联。
- DOI:
- 发表时间:
2007 - 期刊:
- 影响因子:4.3
- 作者:
S. Basu;Ashok Kumar;S. Gupta;B. Bhatia - 通讯作者:
B. Bhatia
GST Polymorphisms and GST Enzyme Activity in Type 1 Myotonic Dystrophy
1 型强直性肌营养不良中的 GST 多态性和 GST 酶活性
- DOI:
- 发表时间:
2015 - 期刊:
- 影响因子:0
- 作者:
Ashok Kumar;S. Agarwal;Suni;L. Pradhan - 通讯作者:
L. Pradhan
Ashok Kumar的其他文献
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{{ truncateString('Ashok Kumar', 18)}}的其他基金
RAPID: Novel Functionalized Nanomaterials for Effective Remediation of Spilled Oil Contaminants in the Gulf of Mexico
RAPID:新型功能化纳米材料可有效修复墨西哥湾泄漏石油污染物
- 批准号:
1066649 - 财政年份:2011
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
EAGER: Novel Nano-hybrid Structured Regioregular Polyhexylthiophenes Blend Films for Organic Photovoltaic Applications
EAGER:用于有机光伏应用的新型纳米混合结构立体规则聚己基噻吩共混薄膜
- 批准号:
1066643 - 财政年份:2010
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
MRI: Acquisition of an Ultrahigh Analytical Thermal Field Emission Scanning Electron Microscope for Research and Education
MRI:购买用于研究和教育的超高分析热场发射扫描电子显微镜
- 批准号:
0922850 - 财政年份:2009
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
GOALI/Collaborative Research: Interface Engineered Diamond Coatings for Dry Machining
GOALI/合作研究:用于干式加工的界面工程金刚石涂层
- 批准号:
0928823 - 财政年份:2009
- 资助金额:
$ 30万 - 项目类别:
Continuing Grant
Engineering and Computer Science Scholars Targeted for Academic, Retention and Success (STARS) at the University of South Florida
南佛罗里达大学工程和计算机科学学者的学术、保留和成功 (STARS)
- 批准号:
0807023 - 财政年份:2008
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
Collaborative Project: An Information Security Track Development - University of Louisville, Kentucky State University
合作项目:信息安全轨道开发 - 路易斯维尔大学、肯塔基州立大学
- 批准号:
0417047 - 财政年份:2004
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
NIRT: Nanocrystalline Diamond Thin Films for MEMS and Biomedical Devices
NIRT:用于 MEMS 和生物医学设备的纳米晶金刚石薄膜
- 批准号:
0404137 - 财政年份:2004
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
GOALI: Investigating Metrology Issues in Chemical Mechanical Planarization Process for Microelectronics Manufacturing
GOALI:研究微电子制造化学机械平坦化工艺中的计量问题
- 批准号:
0218141 - 财政年份:2002
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
MRI: Acquisition of a Transmission Electron Microscope for Multi-disciplinary Research and Education
MRI:购买透射电子显微镜用于多学科研究和教育
- 批准号:
0216308 - 财政年份:2002
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
CAREER: A Faculty Early Career Program in Development of Superhard Coatings for Improved Performances
职业生涯:开发超硬涂层以提高性能的教师早期职业计划
- 批准号:
9983535 - 财政年份:2000
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
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