High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges
超快微毛细管放电中的高能量密度等离子体
基本信息
- 批准号:1004295
- 负责人:
- 金额:$ 59.1万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2010
- 资助国家:美国
- 起止时间:2010-10-01 至 2015-09-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Important plasma applications depend on the ability to generate hot and dense plasma columns of high homogeneity. This project studies the efficient generation of extremely hot and dense uniform plasma columns consisting in the rapid excitation of micro-capillary channels with ultrafast ( 3 ns risetime) current pulses with current densities exceeding 0.5 Giga-Amperes cm-2. Model simulations suggest this new concept has the potential to heat dense homogenous plasma columns to very high electron temperatures (500-1000 eV) using only modest currents. Experiments and simulations will be combined to elucidate the fundamental aspects of the dynamics of these high power density micro-capillary plasmas and optimize their generation for applications. The understanding of the physics of these discharges and their scaling laws can potentially impact the way in which hot dense plasmas are generated for numerous applications. These include the development of compact X-ray lasers, very highly ionized plasma waveguides for high intensity laser-plasma interactions, the generation of high harmonic from ions, and other high density plasma applications. The research and educational activities are designed to have a broad impact in the training of students and young scientists in different stages of their career, ranging from high school to post-doctoral fellows. Significant efforts will be conducted to attract a diverse group of students into science and engineering by continuing our research collaboration with minority serving Colleges and the Colorado AGEP program. The participating graduate and undergraduate students will be involved in an experimental and theoretical effort that will include aspects of discharge physics, advanced discharge technology, spectroscopy and advanced modeling of plasmas. The broader impact will be enhanced by the participation of high school students, and middle school and high school teachers during the summer.
重要的等离子体应用依赖于产生高均匀性的热致密等离子体柱的能力。本项目研究了用超快(3 ns上升时间)电流脉冲(电流密度超过0.5千兆安培厘米-2)快速激发微毛细管通道,高效地产生极热、致密的均匀等离子体柱。模型模拟表明,这种新概念有可能加热致密的均匀等离子体柱到非常高的电子温度(500-1000 eV),只使用适度的电流。实验和模拟将结合起来,阐明这些高功率密度微毛细管等离子体动力学的基本方面,并优化其应用的产生。对这些放电及其标度定律的物理理解可能会影响许多应用中产生热致密等离子体的方式。这些包括紧凑x射线激光器的发展,用于高强度激光-等离子体相互作用的非常高电离等离子体波导,离子产生高谐波以及其他高密度等离子体应用。这些研究和教育活动旨在对从高中到博士后等处于职业生涯不同阶段的学生和青年科学家的培训产生广泛影响。通过继续与少数族裔服务学院和科罗拉多AGEP项目的研究合作,我们将做出重大努力,吸引不同群体的学生进入科学和工程领域。参与的研究生和本科生将参与实验和理论工作,包括放电物理、先进放电技术、光谱学和等离子体的先进建模。高中学生、初中和高中教师在暑假期间的参与将增强更广泛的影响。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Jorge Rocca其他文献
Ponderomotive acceleration with high energy tilted ultrafast laser pulses
高能倾斜超快激光脉冲有质动力加速
- DOI:
- 发表时间:
2023 - 期刊:
- 影响因子:0
- 作者:
Patrick Hunt;Alex M. Wilhelm;Shoujun Wang;R. Hollinger;Ze’ev Shpilman;S. Z. Anaraki;Aaron Davenport;Daniel E. Adams;C. Menoni;Jorge Rocca;Charles Durfee - 通讯作者:
Charles Durfee
Jorge Rocca的其他文献
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{{ truncateString('Jorge Rocca', 18)}}的其他基金
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits
PFI-TT:增强先进集成电路的量产
- 批准号:
2141227 - 财政年份:2022
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1852537 - 财政年份:2019
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits
PFI:AIR - TT:脉冲整形可提高极紫外光刻源的转换效率,用于制造下一代集成电路
- 批准号:
1701238 - 财政年份:2017
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1461231 - 财政年份:2015
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices
OP:将台式软 X 射线激光器转变为高平均功率设备
- 批准号:
1509925 - 财政年份:2015
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
NSF EUV ERC RET in Engineering & Computer Science Site Program
NSF EUV ERC RET 工程
- 批准号:
1301436 - 财政年份:2014
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength
AIR选项2:研究联盟——开发下一代6.X nm波长集成电路投影光刻关键技术
- 批准号:
1343456 - 财政年份:2013
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1157036 - 财政年份:2012
- 资助金额:
$ 59.1万 - 项目类别:
Continuing Grant
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale
MRI-R2:开发用于纳米级科学的高平均功率台式极紫外/软 X 射线激光束线
- 批准号:
0960274 - 财政年份:2010
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
RET-Site Program in Light & Optics for the NSF EUV ERC
Light 中的 RET 站点程序
- 批准号:
0808763 - 财政年份:2008
- 资助金额:
$ 59.1万 - 项目类别:
Standard Grant
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